Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | POLB | P06746 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 4/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | ITGAV | P06756 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10452676 | 0.89 | CYP3A4 (0.47) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10507501 | 0.81 | ALDH1A1 (0.49) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL194578 | 0.80 | ALDH1A1 (0.54) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL60545 | 0.80 | CYP3A4 (0.51) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL384247 | 0.80 | ALDH1A1 (0.67) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10810207 | 0.79 | KMT2A (0.45) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL27826514 | 0.77 | CYP3A4 (0.48) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL2754357 | 0.77 | ALDH1A1 (0.57) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL19862495 | 0.77 | ALDH1A1 (0.50) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10812672 | 0.77 | ALDH1A1 (0.50) | ALDH1A1CYP3A4SMN1; SMN2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | claimed |
| CN-122025633-A | Polymeric adhesive for electrochemical cells including labels | 通用汽车环球科技运作有限责任公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20250231488-A1 | ANTI-REFLECTIVE COATING COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2025-07-17 | — | — | US | disclosed |
| CN-119882348-A | Resist underlayer composition and method for forming pattern using the same | 三星SDI株式会社 | 2025-04-25 | — | — | CN | disclosed |
| CN-119816544-A | Composition, cured product, display device, and solid-state imaging device | 住友化学株式会社 | 2025-04-11 | — | — | CN | disclosed |
| CN-119816543-A | Composition, cured product, display device, and solid-state imaging device | 住友化学株式会社 | 2025-04-11 | — | — | CN | disclosed |
| CN-116323713-B | Curable composition and cured film | 住友化学株式会社 | 2025-04-11 | — | — | CN | disclosed |
| WO-2024254923-A1 | POLYMER FOR PHOTOETCHING MEDIUM COMPOSITION, AND PHOTOETCHING MEDIUM COMPOSITION | 嘉庚创新实验室 | 2024-12-19 | — | — | WO | disclosed |
| WO-2024187508-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC DIELECTRIC COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC DIELECTRIC COMPOSITION | 嘉庚创新实验室 | 2024-09-19 | — | — | WO | disclosed |
| CN-117794737-A | Decorative film, decorative panel and display device | 富士胶片株式会社 | 2024-03-29 | — | — | CN | disclosed |
| US-20050181146-A1 | Antireflective film, polarizing plate including the same, image display unit including the same and method for producing antireflective film | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-18 | — | — | US | disclosed |
| US-20050154086-A1 | Fine inorganic oxide dispersion, coating composition, optical film, antireflection film, polarizing plate, and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2005-07-14 | — | — | US | disclosed |
| WO-2005063484-A1 | ANTIREFLECTION FILM, POLARIZING PLATE, METHOD FOR PRODUCING THEM, LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE | FUJI PHOTO FILM CO., LTD. (JP) | 2005-07-14 | — | — | WO | disclosed |
| US-4837350-A | Process for the preparation of benzoin sulfonates | CIBA-GEIGY CORPORATION (US) | 1989-06-06 | — | — | US | disclosed |
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | disclosed |
| EP-0249365-A2 | Photocatalysts for vinyl compounds activated by an electron donating hetero atom | LOCTITE (IRELAND) Ltd. (IE) | 1987-12-16 | — | — | EP | disclosed |
| US-4708926-A | SULFONIC ESTERS OF A-HYDROXYCARBONYL COMPOUNDS | CIBA-GEIGY CORPORATION (US) | 1987-11-24 | — | — | US | disclosed |
| US-4636575-A | Masked curing catalyst for acid-curable compositions | CIBA-GEIGY CORPORATION (US) | 1987-01-13 | — | — | US | disclosed |
| US-4510290-A | LATENCY; LOW-TEMPERATURE CURING BY SHORTWAVE RADIATION; INKS, LACQUERS | CIBA GEIGY CORPORATION (US) | 1985-04-09 | — | — | US | disclosed |