Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.51 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 3/20 | 0.44 |
| ▸ | MAPT | P10636 | 3/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27826514 | 0.94 | CYP3A4 (0.48) | CYP3A4ALDH1A1NPSR1CYP2C19CYP1A2 | |
| SCHEMBL10452675 | 0.90 | NPSR1 (0.44) | CYP3A4ALDH1A1NPSR1CYP2C19CYP1A2 | |
| SCHEMBL194578 | 0.90 | ALDH1A1 (0.54) | CYP3A4ALDH1A1NPSR1RAB9AMAPT | |
| SCHEMBL28200316 | 0.89 | CYP3A4 (0.47) | CYP3A4ALDH1A1NPSR1CYP2C19CYP1A2 | |
| SCHEMBL19862495 | 0.88 | ALDH1A1 (0.50) | CYP3A4ALDH1A1NPSR1RAB9AMAPT | |
| SCHEMBL11260413 | 0.87 | KEAP1 (0.46) | ALDH1A1NPSR1RECQLRAB9ALMNA | |
| SCHEMBL10813751 | 0.86 | NPC1 (0.61) | CYP3A4ALDH1A1NPSR1CYP2C19RAB9A | |
| SCHEMBL10506692 | 0.86 | ALDH1A1 (0.48) | CYP3A4ALDH1A1RAB9AMAPTNPC1 | |
| SCHEMBL10815926 | 0.86 | ALDH1A1 (0.48) | CYP3A4ALDH1A1RECQLRAB9AMAPT | |
| SCHEMBL10807674 | 0.85 | RECQL (0.50) | ALDH1A1NPSR1RECQLRAB9AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6372 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| EP-3940747-B1 | NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS | YOUNG CHANG CHEMICAL CO LTD (KR) | 2026-05-06 | — | — | EP | claimed |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | claimed |
| US-12535739-B2 | Method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-01-27 | — | — | US | claimed |
| US-12535736-B2 | Anti-reflective hard mask composition | CHEMPOLE CO., LTD. (KR) | 2026-01-27 | — | — | US | claimed |
| US-20260008931-A1 | ORGANIC POLYMER, SEMICONDUCTOR HARD MASK COMPOSITION COMPRISING SAME, AND PATTERNING METHOD USING SAME | HUNETPLUS CO LTD (KR) | 2026-01-08 | — | — | US | claimed |
| EP-3732536-B1 | A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SOLUBLE RESIN AND CROSS LINKERS AND A METHOD FOR MANUFACTURING METAL FILM PATTERNS ON A SUBSTRATE | MERCK PATENT GMBH (DE) | 2025-06-04 | — | — | EP | claimed |
| CN-119620541-A | Preparation and application of bottom anti-reflection coating with high etching rate | 儒芯微电子材料（上海）有限公司 | 2025-03-14 | — | — | CN | claimed |
| EP-4502064-A1 | CURABLE COMPOSITION | DAIKIN INDUSTRIES, LTD. (JP) | 2025-02-05 | — | — | EP | claimed |
| EP-0524187-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS. | DU PONT (US) | 1993-01-27 | — | — | EP | claimed |
| EP-0524250-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-01-27 | — | — | EP | claimed |
| US-5120633-A | Polymers with acid-labile ester/ether pendant groups and acid-generating photoinitiators; positives; printed circuits; resolution | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-06-09 | — | — | US | claimed |
| US-5077174-A | Aqueous development, stripping | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-31 | — | — | US | claimed |
| WO-1991015809-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | claimed |
| WO-1991015808-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | claimed |
| EP-0425142-A2 | Positive acting photoresist and method of producing same | ROHM AND HAAS COMPANY (US) | 1991-05-02 | — | — | EP | claimed |
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | claimed |
| US-4699949-A | Hardening of acid-hardenable compositions containing a blocked hardening catalyst, using heat | CIBA-GEIGY CORPORATION (US) | 1987-10-13 | — | — | US | claimed |
| EP-0132225-B1 | CURING OF ACID-CURABLE COMPOSITIONS CONTAINING A BLOCKED CATALYST WITH THE AID OF HEAT | CIBA-GEIGY AG (CH) | 1987-08-19 | — | — | EP | claimed |