Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 2/20 | 0.34 |
| ▸ | ESR1 | P03372 | 1/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.32 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.32 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.31 |
| ▸ | MAOA | P21397 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.31 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.31 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.31 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL702713 | 0.86 | NR1H2 (0.30) | NR1H2NR1H3 | |
| SCHEMBL711378 | 0.79 | ESR1 (0.34) | CYP2D6ESR1ESR2TDP1NR1H2 | |
| SCHEMBL705454 | 0.79 | TDP1 (0.39) | ESR1ESR2TDP1NR1H2NR1H3 | |
| SCHEMBL24624088 | 0.75 | ESR1 (0.32) | ESR1ESR2TDP1NR1H2NR1H3 | |
| SCHEMBL1538902 | 0.75 | AOC3 (0.34) | ESR1ESR2TDP1NR1H2NR1H3 | |
| SCHEMBL271794 | 0.74 | ESR1 (0.39) | ESR1ESR2TDP1NR1H2NR1H3 | |
| SCHEMBL706818 | 0.74 | MAOA (0.36) | CYP2D6ESR1ESR2TDP1NR1H2 | |
| SCHEMBL13766348 | 0.72 | ESR1 (0.37) | CYP2D6ESR1ESR2TDP1TAAR1 | |
| SCHEMBL9763717 | 0.72 | ESR1 (0.37) | CYP2D6ESR1ESR2TDP1TAAR1 | |
| SCHEMBL5180601 | 0.72 | ESR1 (0.37) | CYP2D6ESR1ESR2TDP1TAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-7960488-B2 | Aluminoxane compositions, their preparation, and their use in catalysis | ALBEMARLE CORPORATION (US) | 2011-06-14 | — | — | US | disclosed |
| EP-1701963-B1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORP (US) | 2011-03-09 | — | — | EP | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20090088541-A1 | ALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2009-04-02 | — | — | US | disclosed |
| US-7355058-B2 | Haloaluminoxane compositions, their preparation, and their use in catalysis | ALBEMARLE CORPORATION (US) | 2008-04-08 | — | — | US | disclosed |
| US-7193100-B2 | Haloaluminoxane compositions, their preparation, and their use in catalysis | ALBEMARLE CORPORATION (US) | 2007-03-20 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| WO-2007005364-A2 | HALOALUMINOXANE COMPOSITIONS | ALBEMARLE CORPORATION (US) | 2007-01-11 | — | — | WO | disclosed |
| US-20060287448-A1 | Haloaluminoxane compositions, their preparation, and their use in catalysis | W. R. GRACE & CO-CONN. | 2006-12-21 | — | — | US | disclosed |
| EP-1701963-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2006-09-20 | — | — | EP | disclosed |
| WO-2005066191-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2005-07-21 | — | — | WO | disclosed |
| US-20050143254-A1 | Haloaluminoxane compositions, their preparation, and their use in catalysis | W. R. GRACE & CO.-CONN. | 2005-06-30 | — | — | US | disclosed |