Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL7094906

CC[B-](c1ccccc1)(c1ccccc1)c1ccccc1.C[N+](C)(C)C

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.36
ALDH1A1 P00352 2/20 0.36
KDM4E B2RXH2 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
APOBEC3A P31941 1/20 0.35
APOBEC3G Q9HC16 1/20 0.35
DNM1 Q05193 2/20 0.31
SCN1A P35498 1/20 0.31
SCN2A Q99250 1/20 0.31
SCN3A Q9NY46 1/20 0.31
PSIP1 O75475 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
MEN1 O00255 1/20 0.31
MAPK1 P28482 1/20 0.31
KMT2A Q03164 1/20 0.31
MAPT P10636 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1040893 0.92 TP53 (0.41) TP53ALDH1A1KDM4EPSIP1SMN1; SMN2
Lithium Ion SCHEMBL7107316 0.90 TP53 (0.39) TP53ALDH1A1KDM4EPSIP1SMN1; SMN2
SCHEMBL21810707 0.90 TP53 (0.39) TP53ALDH1A1KDM4EPSIP1SMN1; SMN2
SCHEMBL4385849 0.81 LMNA (0.37) TP53MEN1KMT2ALMNA
Tetramethylammonium Ion SCHEMBL6435666 0.80 TP53 (0.36) TP53ALDH1A1KDM4ETDP1APOBEC3A
Tetraphenylphosphonium SCHEMBL1209546 0.79 HIF1A (0.36) TP53LMNA
Tetramethylammonium Ion SCHEMBL1276928 0.78 DNM1 (0.39) TP53ALDH1A1DNM1SMN1; SMN2MEN1
Tetramethylammonium Ion SCHEMBL5079963 0.76 ALDH1A1 (0.43) TP53ALDH1A1KDM4ETDP1DNM1
Tetramethylammonium Ion SCHEMBL3615088 0.74 DNM1 (0.44) TP53ALDH1A1DNM1SMN1; SMN2MEN1
Tetramethylammonium Ion SCHEMBL8574603 0.74 DNM1 (0.44) TP53ALDH1A1DNM1SMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0889362-B1 Photopolymerizable composition and dry film resist SHOWA DENKO KK (JP) 2003-08-27 EP disclosed
EP-0922708-B1 Production method of borate compounds SHOWA DENKO KK (JP) 2003-05-14 EP disclosed
US-6033829-A THERMOPLASTIC COPOLYMER OF AN ALPHA, BETA-UNSATURATED CARBOXYL GROUP-CONTAINING MONOMERS AND ANOTHER MONOMER; A CROSSLINKING MONOMER; AND A POLYMERIZATION INITIATOR COMPRISING A QUATERNARY BORON SALT AND A SENSITIZING DYE SHOWA DENKO K.K. (JP) 2000-03-07 US disclosed
US-6002044-A REACTING A LITHIUM OR MAGNEISIUM, A HALIDE AND A BORONATE PRECURSOR OBTAINED IN A FIRSST SIMILAR STEP USING A BORIDE; ADDING AN ONIIUM HALIDE TO THE METAL BORATE; PURITY SHOWA DENKO K.K. (JP) 1999-12-14 US disclosed
EP-0922708-A2 Production method of borate compounds SHOWA DENKO KABUSHIKI KAISHA (JP) 1999-06-16 EP disclosed
EP-0889362-A1 Photopolymerizable composition and dry film resist SHOWA DENKO KABUSHIKI KAISHA (JP) 1999-01-07 EP disclosed