Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 5/20 | 0.49 |
| ▸ | CA1 | P00915 | 4/20 | 0.49 |
| ▸ | CA9 | Q16790 | 4/20 | 0.49 |
| ▸ | PPARG | P37231 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.40 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.40 |
| ▸ | KIF11 | P52732 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.39 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.39 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.38 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL114434 | 0.98 | CA2 (0.50) | CA2CA1CA9PPARGHTT | |
| Biphenyl SCHEMBL4521706 | 0.97 | CA2 (0.49) | CA2CA1CA9PPARGHTT | |
| Hydrogen Sulfide SCHEMBL6248782 | 0.91 | CA2 (0.55) | CA2CA1CA9PPARGHTT | |
| SCHEMBL2750188 | 0.89 | CA2 (0.57) | CA2CA1CA9PPARGHTT | |
| SCHEMBL24360466 | 0.87 | CA2 (0.62) | CA2CA1CA9CXCR2CXCR1 | |
| SCHEMBL5532552 | 0.87 | CA2 (0.62) | CA2CA1CA9CXCR2CXCR1 | |
| Biphenyl SCHEMBL713552 | 0.86 | BACE1 (0.51) | CA2CA1CA9PPARGHTT | |
| Toluene SCHEMBL28787236 | 0.85 | CA1 (0.47) | CA2CA1CA9PPARGHTT | |
| Biphenyl SCHEMBL28551760 | 0.85 | CA1 (0.53) | CA2CA1CA9PPARGCXCR2 | |
| Biphenyl SCHEMBL3395019 | 0.85 | PIK3CD (0.45) | CA2CA1CA9PPARGHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7994050-B2 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2011-08-09 | — | — | US | claimed |
| US-20100311239-A1 | Method for forming dual damascene pattern | LEE KI LYOUNG | 2010-12-09 | — | — | US | claimed |
| US-7811929-B2 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR, INC. (KR) | 2010-10-12 | — | — | US | claimed |
| US-7449538-B2 | Hard mask composition and method for manufacturing semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2008-11-11 | — | — | US | claimed |
| US-20080268641-A1 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR INC. | 2008-10-30 | — | — | US | claimed |
| US-20070154838-A1 | Hard Mask Composition and Method for Manufacturing Semiconductor Device | HYNIX SEMICONDUCTOR INC. (KR) | 2007-07-05 | — | — | US | claimed |
| CN-120535445-A | Preparation method of photoacid generator 2- ((-adamantane-1-carbonyl) oxy) -1, 1-difluoroethane-1-sulfonate diphenyl (p-tolyl) sulfonium salt | 成都东凯芯半导体材料有限公司 | 2025-08-26 | — | — | CN | disclosed |
| CN-110073212-B | Method and system for multiple testing | 博铼生技股份有限公司 | 2024-03-01 | — | — | CN | disclosed |
| US-20220128905-A1 | PHOTORESIST COMPOSITIONS, METHODS FOR FORMING PATTERN USING THE SAME, AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2022-04-28 | — | — | US | disclosed |
| US-10353290-B2 | Photoresist composition for extreme ultraviolet and method of forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-07-16 | — | — | US | disclosed |
| US-20170010531-A1 | PHOTORESIST COMPOSITION FOR EXTREME ULTRAVIOLET AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD (KR) | 2017-01-12 | — | — | US | disclosed |
| US-8293458-B2 | Method for forming fine pattern in semiconductor device | Dongjin Semichem .Co., Ltd. (KR) | 2012-10-23 | — | — | US | disclosed |
| US-8124311-B2 | Photosensitive molecular compound and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2012-02-28 | — | — | US | disclosed |
| EP-1558969-A2 | INCORPORATION OF MARKINGS IN OPTICAL MEDIA | Spectra Systems Corporation (US) | 2005-08-03 | — | — | EP | disclosed |
| WO-2005057285-A1 | THERMAL CURABLE ONE-LIQUID TYPE EPOXY RESIN COMPOSITION FOR OVER-COAT | SAMYANGEMS CO., LTD. (KR) | 2005-06-23 | — | — | WO | disclosed |
| EP-1540416-A2 | SYSTEM FOR APPLYING MARKINGS TO OPTICAL MEDIA | Spectra Systems Corporation (US) | 2005-06-15 | — | — | EP | disclosed |
| US-20050018595-A1 | System for applying markings to optical media | SPECTRA SYSTEMS CORPORATION | 2005-01-27 | — | — | US | disclosed |
| US-20040121268-A1 | Incorporation of markings in optical media | SPECTRA SYSTEMS CORPORATION | 2004-06-24 | — | — | US | disclosed |
| WO-2004042704-A2 | INCORPORATION OF MARKINGS IN OPTICAL MEDIA | SPECTRA SYSTEMS CORPORATION (US) | 2004-05-21 | — | — | WO | disclosed |
| WO-2004027683-A2 | SYSTEM FOR APPLYING MARKINGS TO OPTICAL MEDIA | SPECTRA SYSTEMS CORPORATION (US) | 2004-04-01 | — | — | WO | disclosed |