SCHEMBL7096152

SCHEMBL7096152

CCC(C=C(C)C(=O)O)NC

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.32
KISS1R Q969F8 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17423960 0.84 CHRM1 (0.35)
SCHEMBL2053892 0.82 KDM4E (0.34)
Ammonia Solution, Strong SCHEMBL2497945 0.80
Hydrochloric Acid SCHEMBL6674175 0.80 LCK (0.38)
SCHEMBL6316357 0.79
SCHEMBL515813 0.77 GLO1 (0.40)
SCHEMBL18579742 0.76 FAAH (0.31)
SCHEMBL432889 0.76 ALOX15 (0.40)
SCHEMBL8338046 0.75
SCHEMBL18229226 0.74 POLB (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2003092913-A1 INK-JET COATING COMPOSITIONS, PROCESS FOR MAKING, AND USE IN PROVIDING WATER-RESISTANT IMAGE PIXTERRA, INC. (US) 2003-11-13 WO claimed
WO-2022004197-A1 METHOD FOR MANUFACTURING ABRASIVE GRAINS, COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND METHOD FOR CHEMICAL MECHANICAL POLISHING JSR株式会社 2022-01-06 WO disclosed