SCHEMBL7096718

SCHEMBL7096718

C/C(=C\CCNC(=O)Nc1ccc(C)c(O)c1)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
CYP1A2 P05177 3/20 0.45
CYP2C19 P33261 3/20 0.45
KMT2A Q03164 3/20 0.45
CYP2D6 P10635 2/20 0.45
CYP2C9 P11712 2/20 0.45
MEN1 O00255 2/20 0.45
CYP3A4 P08684 1/20 0.45
GAA P10253 1/20 0.45
MAPT P10636 2/20 0.43
EPHX2 P34913 1/20 0.43
SLC6A3 Q01959 1/20 0.41
CNR1 P21554 3/20 0.40
LMNA P02545 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CASR P41180 1/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA4 P22748 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7096722 1.00 ALDH1A1 (0.46) ALDH1A1CYP1A2CYP2C19KMT2ACYP2D6
SCHEMBL7098030 0.92 EPHX2 (0.48) ALDH1A1CYP1A2CYP2C19KMT2ACYP2D6
SCHEMBL7098036 0.92 EPHX2 (0.48) ALDH1A1CYP1A2CYP2C19KMT2ACYP2D6
SCHEMBL8550844 0.83 ALDH1A1 (0.53) ALDH1A1CYP1A2CYP2C19KMT2ACYP2C9
SCHEMBL8550837 0.83 ALDH1A1 (0.53) ALDH1A1CYP1A2CYP2C19KMT2ACYP2C9
SCHEMBL5670853 0.83 MAOA (0.46) ALDH1A1CYP1A2CYP2C19KMT2ACYP2C9
SCHEMBL4942266 0.83 MAOA (0.46) ALDH1A1CYP1A2CYP2C19KMT2ACYP2C9
SCHEMBL7098402 0.81 ALDH1A1 (0.50) ALDH1A1CYP1A2KMT2AMEN1MAPT
SCHEMBL7098399 0.81 ALDH1A1 (0.50) ALDH1A1CYP1A2KMT2AMEN1MAPT
SCHEMBL8549835 0.80 EPHX1 (0.54) ALDH1A1CYP1A2CYP2C19KMT2ACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0737896-B1 Photosensitive composition and photosensitive planographic printing plate KODAK POLYCHROME GRAPHICS JP (JP) 2003-08-27 EP disclosed
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed