SCHEMBL7098464

SCHEMBL7098464

Cc1cc(C)c(Cc2c(C)c(Cc3cc(C)cc(Cc4cc(C)c(O)c(Cc5c(C)cc(C)cc5O)c4C)c3O)cc(C)c2O)c(O)c1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.46
CYP2C9 P11712 3/20 0.41
CYP2C19 P33261 3/20 0.41
HIF1A Q16665 3/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
HSPA5 P11021 1/20 0.39
CYP2D6 P10635 1/20 0.38
HSD17B10 Q99714 1/20 0.38
SELL P14151 1/20 0.34
SELP P16109 1/20 0.34
SELE P16581 1/20 0.34
ACHE P22303 1/20 0.34
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
TP53 P04637 1/20 0.30
SHBG P04278 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7098334 0.87 AMY1A (0.47) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL7938655 0.86 AMY1A (0.44) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL22500311 0.84 AMY1A (0.53) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL7930652 0.83 AMY1A (0.51) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL12430568 0.82 AMY1A (0.49) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL8586601 0.82 AMY1A (0.46) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL8587659 0.81 SHBG (0.46) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL8501631 0.81 SHBG (0.46) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL7094938 0.81 AMY1A (0.47) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL1661235 0.81 AMY1A (0.71) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030054283-A1 Positive photoresist composition and process for synthesizing polyphenol compound TOKYO OHKA KOGYO CO., LTD. 2003-03-20 US claimed
US-6492085-B1 PHOTOSENSITIZER COMPRISED OF MIXED PRODUCT OF QUINONEDIAZIDE WITH SUCH AS 2,6-BIS(4-HYDROXY-3-(2-HYDROXY-3,5-DIMETHYL-BENZYL)-2,5-DIMETHYLBENZYL)-4 -METHYLPHENOL AND ALKALI SOLUBLE RESIN; DENSE, ISOLATION, AND DOT PATTERNS WITH GOOD SHAPES TOKYO OHKA KOGYO CO., LTD. (JP) 2002-12-10 US claimed
US-6620978-B2 Esterification of a quinonediazide compound; photosensitizer TOKYO OHKA KOGYO CO., LTD. (JP) 2003-09-16 US disclosed
US-20030054283-A1 Positive photoresist composition and process for synthesizing polyphenol compound TOKYO OHKA KOGYO CO., LTD. 2003-03-20 US disclosed
US-6492085-B1 PHOTOSENSITIZER COMPRISED OF MIXED PRODUCT OF QUINONEDIAZIDE WITH SUCH AS 2,6-BIS(4-HYDROXY-3-(2-HYDROXY-3,5-DIMETHYL-BENZYL)-2,5-DIMETHYLBENZYL)-4 -METHYLPHENOL AND ALKALI SOLUBLE RESIN; DENSE, ISOLATION, AND DOT PATTERNS WITH GOOD SHAPES TOKYO OHKA KOGYO CO., LTD. (JP) 2002-12-10 US disclosed