SCHEMBL7106882

SCHEMBL7106882

O=C(c1ccccc1)C(S)c1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.61
L3MBTL1 Q9Y468 1/20 0.61
LMNA P02545 5/20 0.59
CES2 O00748 2/20 0.59
CES1 P23141 2/20 0.59
ALDH1A1 P00352 3/20 0.48
CYP3A4 P08684 1/20 0.48
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA3 P07451 1/20 0.46
CA4 P22748 1/20 0.46
CA6 P23280 1/20 0.46
CA5A P35218 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
CA13 Q8N1Q1 1/20 0.46
CA14 Q9ULX7 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
MDM2 Q00987 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6204248 0.86 CES2 (0.52) TDP1L3MBTL1LMNACES2CES1
SCHEMBL11599066 0.82 SRC (0.50) TDP1L3MBTL1LMNACES2CES1
SCHEMBL10926481 0.80 TDP1 (0.48) TDP1L3MBTL1LMNACES2CES1
SCHEMBL8445181 0.78 CES1 (0.60) TDP1L3MBTL1LMNACES2CES1
SCHEMBL2417683 0.78 TDP1 (0.56) TDP1L3MBTL1LMNACES2CES1
SCHEMBL74366 0.78 SRC (0.56) TDP1L3MBTL1LMNACES2CES1
SCHEMBL2927912 0.76 L3MBTL1 (1.00) TDP1L3MBTL1LMNACES2CES1
SCHEMBL1667152 0.76 TDP1 (0.67) TDP1L3MBTL1LMNACES2CES1
Hydrochloric Acid SCHEMBL8340022 0.76 SRC (0.54) TDP1L3MBTL1LMNACES2CES1
SCHEMBL27913889 0.76 CYP2D6 (0.48) TDP1L3MBTL1LMNACES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0794218-B1 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENG PLASTICS CORP (JP) 2003-10-15 EP disclosed
US-6040367-A EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2000-03-21 US disclosed
US-5948838-A 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) 1999-09-07 US disclosed
EP-0794218-A2 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 1997-09-10 EP disclosed
US-4107012-A COATINGS, PRINTING INKS BAYER AKTIENGESELLSCHAFT (DE) 1978-08-15 US disclosed