SCHEMBL7122940

SCHEMBL7122940

COc1ccc(C(=O)C(OS(=O)(=O)c2ccc(C)cc2)c2ccc(OC)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.56
ALDH1A1 P00352 7/20 0.50
MAPT P10636 6/20 0.50
NPC1 O15118 5/20 0.50
LMNA P02545 4/20 0.50
KMT2A Q03164 3/20 0.50
MEN1 O00255 2/20 0.50
GAA P10253 2/20 0.50
KDM4E B2RXH2 1/20 0.50
HTT P42858 1/20 0.50
RAB9A P51151 4/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
TP53 P04637 2/20 0.48
CYP1A2 P05177 1/20 0.48
CYP3A4 P08684 1/20 0.48
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48
POLB P06746 2/20 0.47
CNR1 P21554 1/20 0.47
TDP1 Q9NUW8 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10452675 0.92 NPSR1 (0.44) NPSR1ALDH1A1MAPTNPC1LMNA
SCHEMBL10505584 0.85 ENPP3 (0.48) NPSR1ALDH1A1MAPTNPC1LMNA
SCHEMBL10813751 0.85 NPC1 (0.61) NPSR1ALDH1A1MAPTNPC1LMNA
SCHEMBL10811773 0.85 TDP1 (0.56) NPSR1ALDH1A1MAPTNPC1LMNA
SCHEMBL10708800 0.83 ALDH1A1 (0.42) NPSR1ALDH1A1MAPTLMNAKMT2A
SCHEMBL60545 0.82 CYP3A4 (0.51) NPSR1ALDH1A1MAPTNPC1LMNA
SCHEMBL27826514 0.82 CYP3A4 (0.48) NPSR1ALDH1A1MAPTNPC1LMNA
SCHEMBL9128620 0.82 MAPT (0.55) NPSR1ALDH1A1MAPTNPC1KMT2A
SCHEMBL10817196 0.81 PLK1 (0.44) ALDH1A1MAPTKMT2AMEN1
SCHEMBL7122948 0.77 ALDH1A1 (0.51) NPSR1ALDH1A1MAPTNPC1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6664021-B1 Acid generator and silicon-containing polyimide ester precursor comprising partially esterified silicon-containing polyamic ester; radiating with light CHISSO CORPORATION (JP) 2003-12-16 US disclosed
US-5449705-A Silicon-containing polyamic acid derivative and photosensitive resin composition using it CHISSO CORPORATION (JP) 1995-09-12 US disclosed
US-5442024-A Polyamic acid having a crosslinkable silane group or copolymerized with a polysiloxane and a compound generating an acid catalyst to effect imidation upon radiating; films; photoresists; shrinkage inhibition; resolution; adhesion CHISSO CORPORATION (JP) 1995-08-15 US disclosed