SCHEMBL7148370

SCHEMBL7148370

CCCC(=O)OCC(CC)OC

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 10/20 0.51
LPAR3 Q9UBY5 4/20 0.50
LPAR6 P43657 3/20 0.50
LPAR1 Q92633 3/20 0.50
LPAR4 Q99677 3/20 0.50
LPAR5 Q9H1C0 3/20 0.50
LPAR2 Q9HBW0 3/20 0.50
ALDH1A1 P00352 2/20 0.49
LMNA P02545 1/20 0.49
PRKCA P17252 1/20 0.45
PRKCE Q02156 1/20 0.45
PRKCQ Q04759 1/20 0.45
PRKCD Q05655 1/20 0.45
TDP1 Q9NUW8 2/20 0.44
CYP3A4 P08684 1/20 0.44
TSHR P16473 1/20 0.44
ATM Q13315 1/20 0.44
RECQL P46063 1/20 0.43
BLM P54132 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29057731 0.85 ENPP2 (0.45) ENPP2LPAR3LPAR6LPAR1LPAR4
SCHEMBL14199965 0.84 ALDH1A1 (0.62) ENPP2LPAR3LPAR1LPAR2ALDH1A1
SCHEMBL448764 0.83 ENPP2 (0.42) ENPP2LPAR3LPAR6LPAR1LPAR4
Acetic Acid SCHEMBL31288702 0.82 ENPP2 (0.43) ENPP2LPAR3LPAR6LPAR1LPAR4
SCHEMBL15132814 0.82 ENPP2 (0.50) ENPP2LPAR3LPAR6LPAR1LPAR4
SCHEMBL783993 0.79 ALDH1A1 (0.46) ENPP2LPAR3LPAR6LPAR1LPAR4
Tributyrin SCHEMBL23825 0.79 ALDH1A1 (0.72) ENPP2LPAR3LPAR1LPAR2ALDH1A1
Tributyrin SCHEMBL601928 0.79 ALDH1A1 (0.72) ENPP2LPAR3LPAR1LPAR2ALDH1A1
SCHEMBL1470166 0.79 ALDH1A1 (0.42) ENPP2LPAR3LPAR6LPAR1LPAR4
SCHEMBL15131421 0.78 MGAM (0.46) ENPP2LPAR3LPAR6LPAR1LPAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113943494-A Coloring composition 住友化学株式会社 2022-01-18 CN disclosed
CN-113534608-A Colored curable resin composition 住友化学株式会社 2021-10-22 CN disclosed
CN-113286829-A Colored curable resin composition 住友化学株式会社 2021-08-20 CN disclosed
US-6528232-B1 Chemically amplified photoresist composition using the novel sulfonium salt compound as the photoacid generator NEC CORPORATION (JP) 2003-03-04 US disclosed