SCHEMBL717022

SCHEMBL717022

CC(C1=CC(=O)NC1=O)S(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31374862 0.71
SCHEMBL1425299 0.71 PTGS2 (0.33)
SCHEMBL3173595 0.68 TSHR (0.37)
SCHEMBL17924947 0.68 MAOA (0.31)
SCHEMBL4821010 0.67 LMNA (0.33)
SCHEMBL23797140 0.66 ESR1 (0.50)
SCHEMBL28120461 0.65 XIAP (0.31)
SCHEMBL9562487 0.65
SCHEMBL17924886 0.65
SCHEMBL11043527 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250183044-A1 SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT FUJIMI INCORPORATED (JP) 2025-06-05 US disclosed
US-12249513-B2 Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment FUJIMI INCORPORATED (JP) 2025-03-11 US disclosed
US-20240141161-A1 BIODEGRADABLE RESIN AQUEOUS DISPERSION, FILM FORMING AGENT USING SAME, AND METHOD FOR FORMING FILM MIYOSHI OIL & FAT CO.,LTD. (JP) 2024-05-02 US disclosed
CN-111885997-B Water-absorbing abrasive, method for producing same, and cosmetic 住友精化株式会社 2023-05-09 CN disclosed
CN-115703207-A Surface treatment method, method for manufacturing semiconductor substrate, surface treatment composition, and system for manufacturing semiconductor substrate 福吉米株式会社 2023-02-17 CN disclosed
US-20230053210-A1 SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT FUJIMI INCORPORATED (JP) 2023-02-16 US disclosed
CN-111902581-B Sandbag and manufacturing method thereof 住友精化株式会社 2023-02-03 CN disclosed
US-20210138434-A1 SANDBAG AND METHOD FOR PRODUCING SAME SUMITOMO SEIKO CHEMICALS CO., LTD. (JP) 2021-05-13 US disclosed
US-10987299-B2 Polylactic acid-containing aqueous dispersion TOYOBO CO., LTD. (JP) 2021-04-27 US disclosed
EP-3777826-A1 WATER-ABSORBING EXFOLIATOR, METHOD FOR PRODUCING SAME, AND COSMETIC Sumitomo Seika Chemicals Co., Ltd. (JP) 2021-02-17 EP disclosed
EP-0396303-B1 Process for producing and use of maleic acid (co-) polymer salt improved in biodegradability NIPPON CATALYTIC CHEM IND (JP) 1994-12-28 EP disclosed
EP-0368563-B1 Drilling fluid additives NIPPON CATALYTIC CHEM IND (JP) 1994-02-16 EP disclosed
EP-0337694-B1 Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer NIPPON CATALYTIC CHEM IND (JP) 1993-12-29 EP disclosed
US-5135677-A Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer NIPPON SHOKUBAI CO., LTD. (JP) 1992-08-04 US disclosed
US-5064563-A Hydrogen peroxide polymerization catalyst copper or iron ions and alkali to neutralize acid; detergent builder NIPPON SHOKUBAI CO., LTD. (JP) 1991-11-12 US disclosed
EP-0396303-A2 Process for producing and use of maleic acid (co-) polymer salt improved in biodegradability NIPPON SHOKUBAI CO., LTD. (JP) 1990-11-07 EP disclosed
EP-0368563-A2 Drilling fluid additives NIPPON SHOKUBAI CO., LTD. (JP) 1990-05-16 EP disclosed
US-4892902-A WATER SOLUBLE CONDENSED PHOSPHATE AND WATER SOLUBLE ANIONIC MODIFIED POLYVINYL ALCOHOL AS DISPERSANT NIPPON SHOKUBAI KAGAKU, CO., LTD. (JP) 1990-01-09 US disclosed
EP-0337694-A2 Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer NIPPON SHOKUBAI CO., LTD. (JP) 1989-10-18 EP disclosed
US-4818783-A USING AS DISPERSANT WATE SOLUBLE CARBOXYL-CONTAINING POLYMER AND ANIONIC MODIFIED POLYVINYL ALCOHOL NIPPON SHOKUBAI KAGAKU KOGYO CO., LTD. (JP) 1989-04-04 US disclosed