Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25960823 | 0.97 | HRH3 (0.46) | HRH3TSHR | |
| SCHEMBL7828951 | 0.94 | HRH3 (0.44) | HRH3TSHR | |
| SCHEMBL26161632 | 0.91 | HRH3 (0.43) | HRH3TSHR | |
| SCHEMBL8462300 | 0.90 | HRH3 (0.48) | HRH3TSHR | |
| SCHEMBL17615514 | 0.89 | HRH3 (0.42) | HRH3TSHR | |
| SCHEMBL10175549 | 0.89 | TSHR (0.50) | HRH3TSHR | |
| SCHEMBL27805443 | 0.88 | HRH3 (0.47) | HRH3TSHR | |
| SCHEMBL29926359 | 0.88 | HRH3 (0.47) | HRH3TSHR | |
| SCHEMBL4451768 | 0.88 | HRH3 (0.47) | HRH3TSHR | |
| SCHEMBL19420791 | 0.87 | HRH3 (0.41) | HRH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | claimed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| US-20230026579-A1 | METHOD FOR FORMING PHOTORESIST PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230026721-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230028244-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| WO-2017144898-A1 | WOOD PRODUCT | JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) | 2017-08-31 | — | — | WO | claimed |
| EP-0944600-B1 | PROCESS FOR CONVERTING HYDROXY HETEROAROMATICS TO ARYLAMINES | AVENTIS PHARMA INC (US) | 2002-01-30 | — | — | EP | claimed |
| EP-0888380-B1 | PROCESS FOR ALKYLATING AND SMILES REARRANGEMENT OF HYDROXY AROMATICS | AVENTIS PHARMA INC (US) | 2001-10-31 | — | — | EP | claimed |
| US-6034241-A | Process for converting hydroxy heteroaromatics to arylamines | HOECHST MARION ROUSSEL INC. (US) | 2000-03-07 | — | — | US | claimed |
| EP-0944600-A1 | PROCESS FOR CONVERTING HYDROXY HETEROAROMATICS TO ARYLAMINES | HOECHST MARION ROUSSEL, INC. (US) | 1999-09-29 | — | — | EP | claimed |
| EP-0888380-A1 | PROCESS FOR ALKYLATING AND SMILES REARRANGEMENT OF HYDROXY AROMATICS | HOECHST MARION ROUSSEL, INC. (US) | 1999-01-07 | — | — | EP | claimed |
| US-5817874-A | Process for alkylating and smiles rearrangement of hydroxy aromatics | HOECHST MARION ROUSSEL, INC. (US) | 1998-10-06 | — | — | US | claimed |
| WO-1998023589-A1 | PROCESS FOR CONVERTING HYDROXY HETEROAROMATICS TO ARYLAMINES | HOECHST MARION ROUSSEL, INC. (US) | 1998-06-04 | — | — | WO | claimed |
| WO-1997034916-A1 | PROCESS FOR ALKYLATING AND SMILES REARRANGEMENT OF HYDROXY AROMATICS | HOECHST MARION ROUSSEL, INC. (US) | 1997-09-25 | — | — | WO | claimed |
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| US-4981930-A | POLYMERIZATION CATALYSTS | IDEMITSU PETROCHEMICAL COMPANY LIMITED (JP) | 1991-01-01 | — | — | US | disclosed |
| EP-0284005-A2 | Method of production of polyolefins | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1988-09-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | TOP1, TOP2A, FTO | HRH3 3082/4885TSHR 4101/4885 |
| US-12631966-B2 | Method for forming photoresist patterns | FTO, SOAT1, SOAT2 | HRH3 1178/4885TSHR 2294/4885 |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | FGFR2, FGFR1, FDFT1 | HRH3 2758/4885TSHR 2810/4885 |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | COL2A1, TOP1, TOP2A | HRH3 4572/4885TSHR 4643/4885 |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | RER1, TOP1, RRS1 | HRH3 922/4885TSHR 1475/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.