⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7200087 | 0.87 | — | — | |
| SCHEMBL148270 | 0.79 | IDO1 (0.44) | — | |
| SCHEMBL7753169 | 0.79 | IDO1 (0.44) | — | |
| SCHEMBL7197964 | 0.77 | NQO1 (0.36) | — | |
| SCHEMBL5934178 | 0.74 | MAPT (0.39) | — | |
| SCHEMBL40509 | 0.74 | ALDH1A1 (0.41) | — | |
| SCHEMBL7834557 | 0.74 | KDM4E (0.33) | — | |
| SCHEMBL1219151 | 0.72 | LTA4H (0.41) | — | |
| SCHEMBL6289014 | 0.71 | SLC22A6 (0.46) | — | |
| SCHEMBL10754785 | 0.71 | KMT2A (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6509426-B2 | Dichloro(1,1'-dimethylsilylenebis(2-methyl-4-(4-methoxyphenyl) -4H-azulenyl))zirconium, for example; can produce polyolefin with high molecular weight and high melting point for extrusion or injection moldability | JAPAN POLYCHEM CORPORATION (JP) | 2003-01-21 | — | — | US | claimed |
| US-6509426-B2 | Dichloro(1,1'-dimethylsilylenebis(2-methyl-4-(4-methoxyphenyl) -4H-azulenyl))zirconium, for example; can produce polyolefin with high molecular weight and high melting point for extrusion or injection moldability | JAPAN POLYCHEM CORPORATION (JP) | 2003-01-21 | — | — | US | disclosed |
| US-20010023296-A1 | Novel transition metal compound, catalyst component for olefin polymerization and process for the preparation of alpha-olefin polymer | JAPAN POLYCHEM CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6218558-B1 | BRIDGED OXYGEN-, NITROGEN- OR SULFUR-CONTAINING METALLOCENE CATALYST CONTAINING AT LEAST CYCLOPENTADIENE RING FUSED TO A C7-10 RING | JAPAN POLYCHEM CORPORATION (JP) | 2001-04-17 | — | — | US | disclosed |
| EP-0762207-B1 | Positive working photosensitive composition and method of producing relief structures | BASF AG (DE) | 2000-04-12 | — | — | EP | disclosed |
| EP-0963996-A2 | Novel transition metal compound, catalyst component for olefin polymerization and process for the preparation of alpha-olefin polymer | Japan Polychem Corporation (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5914219-A | Radiation-sensitive mixture and the production of relief structures having improved contrast | BASF AKTIENGESELLSCHAFT (DE) | 1999-06-22 | — | — | US | disclosed |
| EP-0616258-B1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF AG (DE) | 1997-05-21 | — | — | EP | disclosed |
| EP-0762207-A2 | Positive working photosensitive composition and method of producing relief structures | BASF AKTIENGESELLSCHAFT (DE) | 1997-03-12 | — | — | EP | disclosed |
| EP-0616258-A1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF Aktiengesellschaft (DE) | 1994-09-21 | — | — | EP | disclosed |
| US-5318876-A | Solutions of water insoluble, base soluble polymeric binder, substituted sulfonium salts, substituted benzenesulfonates, having tolerance for delay between exposure and heating to develop | BASF AKTIENGESELLSCHAFT (DE) | 1994-06-07 | — | — | US | disclosed |
| US-5300400-A | Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound | BASF AKTIENGESELLSCHAFT (DE) | 1994-04-05 | — | — | US | disclosed |
| US-5191124-A | Photoinitiators for Cationic Polymerization | BASF AKTIENGESELLSCHAFT (DE) | 1993-03-02 | — | — | US | disclosed |
| US-5084371-A | POSITIVE-WORKING, RADIATION-SENSITIVE MIXTURE BASED ON ACID-CLEAVABLE AND PHOTOCHEMICALLY ACID-FORMING COMPOUNDS, AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1992-01-28 | — | — | US | disclosed |
| US-5069998-A | RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-03 | — | — | US | disclosed |
| US-5064746-A | RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1991-11-12 | — | — | US | disclosed |
| US-4883740-A | RELIEF PATTERNS AND IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1989-11-28 | — | — | US | disclosed |