SCHEMBL7196153

SCHEMBL7196153

CC(C)(C)NC=CC(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.40
TP53 P04637 1/20 0.40
EGLN1 Q9GZT9 1/20 0.40
EGLN3 Q9H6Z9 1/20 0.40
HCAR2 Q8TDS4 3/20 0.39
ALDH1A1 P00352 5/20 0.34
ALOX15 P16050 2/20 0.34
RECQL P46063 2/20 0.34
HSD17B10 Q99714 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
GAA P10253 1/20 0.34
GABRP O00591 2/20 0.32
GABRD O14764 2/20 0.32
GABRA1 P14867 2/20 0.32
GABRB1 P18505 2/20 0.32
GABRG2 P18507 2/20 0.32
GABRB3 P28472 2/20 0.32
GABRA5 P31644 2/20 0.32
GABRA3 P34903 2/20 0.32
GABRA2 P47869 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11738607 0.79 ALDH1A1 (0.30) ALDH1A1
SCHEMBL14707348 0.77 ALDH1A1 (0.43) ALDH1A1HSD17B10TDP1GAAKDM4E
SCHEMBL22305401 0.77
SCHEMBL10564524 0.75 NFE2L2 (0.55) TP53HCAR2ALDH1A1ALOX15RECQL
SCHEMBL10564520 0.75 NFE2L2 (0.55) TP53HCAR2ALDH1A1ALOX15RECQL
SCHEMBL21957469 0.73 KDM4E (0.42) ALDH1A1HSD17B10GAAKDM4EMAPT
SCHEMBL21957470 0.73 KDM4E (0.42) ALDH1A1HSD17B10GAAKDM4EMAPT
SCHEMBL4549129 0.69
SCHEMBL20961907 0.69
SCHEMBL3068136 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5001192-A Polymeric polyblend composition THE DOW CHEMICAL COMPANY (US) 1991-03-19 US claimed
US-4975487-A Vinylidine chloride interpolymer and a thermoplastic graft polymer THE DOW CHEMICAL COMPANY (US) 1990-12-04 US claimed
CN-113214429-B ArF photoresist film-forming resin, preparation method thereof and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2022-04-12 CN disclosed
CN-113214429-A ArF photoresist film-forming resin, preparation method thereof and photoresist composition 中科院长春应化所黄埔先进材料研究院 2021-08-06 CN disclosed
US-6596519-B2 Mixture containing fatty acid from enzyme decomposition of vegetable oils, fat THE NISSHIN OIL MILLS, LTD. (JP) 2003-07-22 US disclosed
US-20020010298-A1 Paint or ink composition NISSHIN OILLIO GROUP, LTD., THE (JP) 2002-01-24 US disclosed
EP-1158032-A1 COATING MATERIAL OR INK COMPOSITION The Nisshin Oil Mills, Ltd. (JP) 2001-11-28 EP disclosed
EP-1001950-A1 FLUORINATED TRIAZINE MONOMERS THE SECRETARY OF STATE FOR DEFENCE (GB) 2000-05-24 EP disclosed
US-6015645-A HAVING HOLE BLOCKING LAYER COMPRISED OF POLYHALOALKYLSTYRENE XEROX CORPORATION (US) 2000-01-18 US disclosed
US-5907001-A Process for the preparation of photopatternable polymers XEROX CORPORATION (US) 1999-05-25 US disclosed
WO-1999005127-A1 FLUORINATED TRIAZINE MONOMERS THE SECRETARY OF STATE FOR DEFENCE (GB) 1999-02-04 WO disclosed
US-3941718-A Insoluble crosslinked homopolymers and copolymers, polymerized on an inert substrate GAF CORPORATION (US) 1976-03-02 US disclosed