SCHEMBL721732

SCHEMBL721732

C=C(C)C(N)=O.CCS(=O)(=O)O

nearest known ligand 0.63

Known targets — ChEMBL curated mechanism

FGFR1FGFR2FGFR3FGFR4FLT1FLT4KDRPDGFRAPDGFRB

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.63
LMNA P02545 2/20 0.35
BLM P54132 2/20 0.35
ALOX15 P16050 2/20 0.35
PMP22 Q01453 1/20 0.35
SLC6A6 P31641 1/20 0.32
CYP2C19 P33261 1/20 0.32
ALDH1A1 P00352 2/20 0.32
THRB P10828 1/20 0.31
TSHR P16473 2/20 0.30
TGFBR1 P36897 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL193449 0.86 TDP1 (0.52) TDP1LMNABLMSLC6A6CYP2C19
Sulfuric Acid SCHEMBL27929434 0.86 TDP1 (0.75) TDP1LMNABLMALOX15PMP22
Sulfuric Acid SCHEMBL421211 0.86 TDP1 (0.75) TDP1LMNABLMALOX15PMP22
Sulfuric Acid SCHEMBL27615797 0.86 TDP1 (0.75) TDP1LMNABLMALOX15PMP22
SCHEMBL27474859 0.84 TDP1 (0.50) TDP1LMNABLMSLC6A6CYP2C19
Sulfuric Acid SCHEMBL25289160 0.83 TDP1 (0.71) TDP1LMNABLMALOX15PMP22
SCHEMBL723932 0.83 TDP1 (0.71) TDP1LMNABLMALOX15PMP22
Sulfuric Acid SCHEMBL28014011 0.83 TDP1 (0.71) TDP1LMNABLMALOX15PMP22
Sulfuric Acid SCHEMBL28014012 0.83 TDP1 (0.71) TDP1LMNABLMALOX15PMP22
Propane SCHEMBL22974974 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3398973-B1 METHOD FOR PRODUCING COPOLYMER NIPPON CATALYTIC CHEM IND (JP) 2020-04-01 EP disclosed
US-10570233-B2 Method for producing copolymer NIPPON SHOKUBAI CO., LTD. (JP) 2020-02-25 US disclosed
US-20190210921-A1 ADDITIVE FOR CEMENT COMPOSITION AND CEMENT COMPOSITION NIPPON PAPER INDUSTRIES CO., LTD. (JP) 2019-07-11 US disclosed
CN-109923087-A Cement composition additive and cement composition 日本制纸株式会社 2019-06-21 CN disclosed
US-20190127504-A1 METHOD FOR PRODUCING COPOLYMER NIPPON SHOKUBAI CO., LTD. (JP) 2019-05-02 US disclosed
CN-109641395-A The manufacturing method of ink-jet 3D printer photo-curable backing material composition, ink-jet 3D printer ink, ink-jet 3D printer print cartridge, the manufacturing method of backing material and light chisel object 株式会社日本触媒 2019-04-16 CN disclosed
CN-109641201-A Formed gel product and sintered article prepared therefrom 3M创新有限公司 2019-04-16 CN disclosed
US-10227258-B2 Shrinkage-reducing agent for hydraulic material NIPPON SHOKUBAI CO., LTD. (JP) 2019-03-12 US disclosed
US-10208203-B2 Monomer composition containing unsaturated polyalkylene glycol ether-based monomer, method for producing composition thereof, polymer obtained using composition thereof, and method for producing polymer thereof NIPPON SHOKUBAI CO., LTD. (JP) 2019-02-19 US disclosed
EP-3398973-A1 METHOD FOR PRODUCING COPOLYMER Nippon Shokubai Co., Ltd. (JP) 2018-11-07 EP disclosed
CN-1537126-A Polycarboxylic acid type copolymer, and preparation method and use thereof 株式会社日本触媒 2004-10-13 CN disclosed
US-6733941-B1 ETHYLENE POLYMER, PARAFFIN WAX AND BINDER; LOW TEMPERATURE FIXATION, OFFSET RESISTANCE, PRESERVING IMAGE QUALITY MITSUI CHEMICALS, INC. (JP) 2004-05-11 US disclosed
CN-1148329-C Cement dispersant agent and cement compsn. using same 株式会社日本触媒 2004-05-05 CN disclosed
US-20040024152-A1 Gas hydrate formation inhibitor and method for inhibiting gas hydrate formation with the same MITSUBISHI RAYON CO., LTD. (JP) 2004-02-05 US disclosed
US-20030130454-A1 Process for producing amphipathic polymers MITSUBISHI RAYON CO., LTD. 2003-07-10 US disclosed
CN-1412145-A Cement dispersant, method for producing same, and cement composition using same NIPPON CATALYTIC CHEM IND (JP) 2003-04-23 CN disclosed
CN-1390319-A Resin composition for toner and toner MITSUI CHEMICALS INC (JP) 2003-01-08 CN disclosed
EP-1262838-A1 RESIN COMPOSITION FOR TONER AND TONER Mitsui Chemicals, Inc. (JP) 2002-12-04 EP disclosed
CN-1343642-A Cement dispersant agent and cement compsn. using same NIPPON CATALYTIC CHEM IND (JP) 2002-04-10 CN disclosed
CN-1199607-A Hair cosmetics SHOWA DENKO KK (JP) 1998-11-25 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10208203-B2 Monomer composition containing unsaturated polyalkylene glycol ether-based monomer, method for producing composition thereof, polymer obtained using composition thereof, and method for producing polymer thereof ALOX12, ALOX15, ALOX15B TDP1 2163/4885LMNA 1927/4885BLM 2541/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.