SCHEMBL723932

SCHEMBL723932

C=C(C)C(N)=O.CS(=O)(=O)O

nearest known ligand 0.71

Known targets — ChEMBL curated mechanism

ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.71
ALDH1A1 P00352 1/20 0.39
BLM P54132 3/20 0.39
LMNA P02545 1/20 0.39
ALOX15 P16050 1/20 0.39
PMP22 Q01453 1/20 0.39
CRBN Q96SW2 1/20 0.35
CA2 P00918 2/20 0.33
TGFBR1 P36897 1/20 0.32
KDM4E B2RXH2 2/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
TAS2R38 P59533 1/20 0.32
CA1 P00915 2/20 0.32
TSHR P16473 1/20 0.32
NT5E P21589 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32
CA5A P35218 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL421211 0.91 TDP1 (0.75) TDP1ALDH1A1BLMLMNAALOX15
Sulfuric Acid SCHEMBL27929434 0.91 TDP1 (0.75) TDP1ALDH1A1BLMLMNAALOX15
Sulfuric Acid SCHEMBL27615797 0.91 TDP1 (0.75) TDP1ALDH1A1BLMLMNAALOX15
Sulfuric Acid SCHEMBL25289160 0.88 TDP1 (0.71) TDP1ALDH1A1BLMLMNAALOX15
Sulfuric Acid SCHEMBL28014012 0.88 TDP1 (0.71) TDP1ALDH1A1BLMLMNAALOX15
Sulfuric Acid SCHEMBL28014011 0.88 TDP1 (0.71) TDP1ALDH1A1BLMLMNAALOX15
SCHEMBL2128293 0.84 TDP1 (1.00) TDP1ALDH1A1BLMLMNAALOX15
SCHEMBL14870 0.84
SCHEMBL5708652 0.84 TDP1 (1.00) TDP1ALDH1A1BLMLMNAALOX15
SCHEMBL721732 0.83 TDP1 (0.63) TDP1ALDH1A1BLMLMNAALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-6158558-A None JP disclosed
EP-3398973-B1 METHOD FOR PRODUCING COPOLYMER NIPPON CATALYTIC CHEM IND (JP) 2020-04-01 EP disclosed
US-10570233-B2 Method for producing copolymer NIPPON SHOKUBAI CO., LTD. (JP) 2020-02-25 US disclosed
US-20190210921-A1 ADDITIVE FOR CEMENT COMPOSITION AND CEMENT COMPOSITION NIPPON PAPER INDUSTRIES CO., LTD. (JP) 2019-07-11 US disclosed
US-20190127504-A1 METHOD FOR PRODUCING COPOLYMER NIPPON SHOKUBAI CO., LTD. (JP) 2019-05-02 US disclosed
US-10227258-B2 Shrinkage-reducing agent for hydraulic material NIPPON SHOKUBAI CO., LTD. (JP) 2019-03-12 US disclosed
US-10208203-B2 Monomer composition containing unsaturated polyalkylene glycol ether-based monomer, method for producing composition thereof, polymer obtained using composition thereof, and method for producing polymer thereof NIPPON SHOKUBAI CO., LTD. (JP) 2019-02-19 US disclosed
EP-3398973-A1 METHOD FOR PRODUCING COPOLYMER Nippon Shokubai Co., Ltd. (JP) 2018-11-07 EP disclosed
EP-2308807-B1 SHRINKAGE-REDUCING AGENT FOR HYDRAULIC MATERIAL AND SHRINKAGE REDUCING AGENT COMPOSITION FOR HYDRAULIC MATERIAL NIPPON CATALYTIC CHEM IND (JP) 2018-07-11 EP disclosed
CN-107735728-A Photosensitive composite, colored filter photosensitive composite and colored filter 东洋油墨SC控股株式会社 2018-02-23 CN disclosed
EP-1524314-A1 Detergent builder and detergent composition Nippon Shokubai Co., Ltd. (JP) 2005-04-20 EP disclosed
CN-1537126-A Polycarboxylic acid type copolymer, and preparation method and use thereof 株式会社日本触媒 2004-10-13 CN disclosed
US-6733941-B1 ETHYLENE POLYMER, PARAFFIN WAX AND BINDER; LOW TEMPERATURE FIXATION, OFFSET RESISTANCE, PRESERVING IMAGE QUALITY MITSUI CHEMICALS, INC. (JP) 2004-05-11 US disclosed
CN-1148329-C Cement dispersant agent and cement compsn. using same 株式会社日本触媒 2004-05-05 CN disclosed
US-20040024152-A1 Gas hydrate formation inhibitor and method for inhibiting gas hydrate formation with the same MITSUBISHI RAYON CO., LTD. (JP) 2004-02-05 US disclosed
US-20030130454-A1 Process for producing amphipathic polymers MITSUBISHI RAYON CO., LTD. 2003-07-10 US disclosed
CN-1412145-A Cement dispersant, method for producing same, and cement composition using same NIPPON CATALYTIC CHEM IND (JP) 2003-04-23 CN disclosed
EP-1262838-A1 RESIN COMPOSITION FOR TONER AND TONER Mitsui Chemicals, Inc. (JP) 2002-12-04 EP disclosed
CN-1343642-A Cement dispersant agent and cement compsn. using same NIPPON CATALYTIC CHEM IND (JP) 2002-04-10 CN disclosed
JP-H06158558-A PROCESS OF PRINTING FIBROUS MATERIAL BY DIRECT PRINTING METHOD CIBA GEIGY AG 1994-06-07 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10208203-B2 Monomer composition containing unsaturated polyalkylene glycol ether-based monomer, method for producing composition thereof, polymer obtained using composition thereof, and method for producing polymer thereof ALOX12, ALOX15, ALOX15B TDP1 2163/4885ALDH1A1 1159/4885BLM 2541/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.