Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | EEF2K | O00418 | 1/20 | 0.38 |
| ▸ | DRD2 | P14416 | 1/20 | 0.32 |
| ▸ | DRD3 | P35462 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7773581 | 0.98 | EEF2K (0.38) | MEN1KMT2AEEF2KDRD2DRD3 | |
| SCHEMBL24059182 | 0.93 | EEF2K (0.40) | MEN1KMT2AEEF2KDRD2DRD3 | |
| Hydrochloric Acid SCHEMBL7773825 | 0.90 | EEF2K (0.45) | MEN1KMT2AEEF2K | |
| Hydrochloric Acid SCHEMBL31093206 | 0.90 | EEF2K (0.45) | MEN1KMT2AEEF2K | |
| SCHEMBL31093234 | 0.88 | EEF2K (0.46) | MEN1KMT2AEEF2K | |
| SCHEMBL31093210 | 0.88 | EEF2K (0.46) | MEN1KMT2AEEF2K | |
| SCHEMBL24052262 | 0.88 | EEF2K (0.46) | MEN1KMT2AEEF2K | |
| SCHEMBL31093239 | 0.83 | EEF2K (0.42) | EEF2K | |
| SCHEMBL31093227 | 0.83 | EEF2K (0.42) | EEF2K | |
| Hydrochloric Acid SCHEMBL7773582 | 0.82 | EEF2K (0.31) | EEF2K |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0769512-B1 | Process for preparing polycondensation polymers using haloiminium salts as condensation agents | MITSUI CHEMICALS INC (JP) | 2001-07-18 | — | — | EP | claimed |
| US-5719256-A | CONDENSING CARBOXYL GROUP CONTAINING COMPOUND AND ACTIVE HYDROGEN CONTAINING COMPOUND IN PRESENCE OF HALOIMINIUM SALT AS POLYMERIZATION CATALYST | MITSU TOATSU CHEMICALS, INC. (JP) | 1998-02-17 | — | — | US | claimed |
| EP-0769512-A2 | Process for preparing polycondensation polymers | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-04-23 | — | — | EP | claimed |
| CN-107848963-B | Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same | 富士胶片和光纯药株式会社 | 2020-11-03 | — | — | CN | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3098226-B1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2018-10-16 | — | — | US | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-3098226-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-6632949-B2 | Difluoro-diamine methylene derivatives | MITSUI CHEMICALS, INC. (JP) | 2003-10-14 | — | — | US | disclosed |
| US-20030004348-A1 | Halogenating agents | SONODA HIROSHI (JP) | 2003-01-02 | — | — | US | disclosed |
| US-6458990-B1 | BIS(DIHYDROCARBYLAMINO)DIFLUOROMETHANE OR CYCLIC DERIVATIVES THEREOF; FORMING BY REACTING ALKALI METAL HALIDE WITH THE CORRESPONDING AMIDINIUM SALT; FLUORINATION OF ALCOHOLS, THIOPHENOLS, ALDEHYDES, AND KETONES | MITSUI CHEMICALS, INC. (JP) | 2002-10-01 | — | — | US | disclosed |
| US-20020042521-A1 | Nitrogen-based halogenating agents and process for preparing halogen-containing compounds | SONODA HIROSHI (JP) | 2002-04-11 | — | — | US | disclosed |
| EP-0769512-B1 | Process for preparing polycondensation polymers using haloiminium salts as condensation agents | MITSUI CHEMICALS INC (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-5892061-A | REACTING A MONO- OR POLYCARBOXYLIC ACID WITH A MONO- OR POLYAMIDE IN THE PRESENCE OF A HALOIMINIUM SALT AND BASE; CATALYST SELECTIVITY | MITSUI CHEMICALS, INC. (JP) | 1999-04-06 | — | — | US | disclosed |
| EP-0846714-A1 | Preparation process of isoimide | Mitsui Chemicals, Inc. (JP) | 1998-06-10 | — | — | EP | disclosed |
| US-5719256-A | CONDENSING CARBOXYL GROUP CONTAINING COMPOUND AND ACTIVE HYDROGEN CONTAINING COMPOUND IN PRESENCE OF HALOIMINIUM SALT AS POLYMERIZATION CATALYST | MITSU TOATSU CHEMICALS, INC. (JP) | 1998-02-17 | — | — | US | disclosed |
| EP-0769512-A2 | Process for preparing polycondensation polymers | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-04-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | MEN1 1882/4885KMT2A 1530/4885EEF2K 1377/4885 |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | BLM, HPRT1, BROX | MEN1 28/4885KMT2A 2230/4885EEF2K 3170/4885 |
| US-20030004348-A1 | Halogenating agents | AFF1, NAF1, AFF2 | MEN1 1402/4885KMT2A 1834/4885EEF2K 1520/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | MEN1 1882/4885KMT2A 1530/4885EEF2K 1377/4885 |
| US-20020042521-A1 | Nitrogen-based halogenating agents and process for preparing halogen-containing compounds | AFF1, NAF1, CYP2F1 | MEN1 1242/4885KMT2A 2122/4885EEF2K 1370/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.