SCHEMBL722543

SCHEMBL722543

O=C1C=CC(=O)N1c1c2ccccc2nc2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MGLL Q99685 3/20 0.48
▸ TLR9 Q9NR96 1/20 0.45
▸ KDM4E B2RXH2 7/20 0.44
▸ ALDH1A1 P00352 5/20 0.44
▸ GLA P06280 3/20 0.43
▸ SMN1; SMN2 Q16637 3/20 0.43
▸ HPGD P15428 3/20 0.43
▸ MAOA P21397 2/20 0.43
▸ CASP1 P29466 2/20 0.43
▸ CASP7 P55210 2/20 0.43
▸ HSD17B10 Q99714 2/20 0.43
▸ TDP1 Q9NUW8 2/20 0.43
▸ CHRM2 P08172 1/20 0.43
▸ ADRA2A P08913 1/20 0.43
▸ ADORA3 P0DMS8 1/20 0.43
▸ CHRM1 P11229 1/20 0.43
▸ NQO2 P16083 1/20 0.43
▸ DRD1 P21728 1/20 0.43
▸ ACHE P22303 1/20 0.43
▸ SLC6A2 P23975 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29378993 1.00 MGLL (0.48) MGLLTLR9KDM4EALDH1A1GLA
SCHEMBL28080544 0.88 MGLL (0.41) MGLLTLR9KDM4EALDH1A1GLA
SCHEMBL26105231 0.76 TLR9 (0.54) MGLLTLR9ALDH1A1HPGDFAAH
SCHEMBL19511809 0.76 TLR9 (0.54) MGLLTLR9ALDH1A1HPGDFAAH
SCHEMBL4072228 0.72 TLR9 (0.50) MGLLTLR9KDM4EALDH1A1GLA
SCHEMBL30497722 0.72 TLR9 (0.50) MGLLTLR9KDM4EALDH1A1GLA
SCHEMBL28099940 0.72 KDM1A (0.51) KDM4EALDH1A1GLASMN1; SMN2HPGD
SCHEMBL28883464 0.69 MGLL (0.48) MGLLTLR9KDM4EALDH1A1SMN1; SMN2
SCHEMBL21826723 0.69 TLR9 (0.52) MGLLTLR9ALDH1A1HSD17B10TDP1
SCHEMBL31179986 0.69 TLR9 (0.52) MGLLTLR9ALDH1A1HSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1071 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250276107-A1 HYDROGEL SYSTEMS AND METHODS FOR TREATING FISTULA AND OTHER INDICATIONS TERASAKI INSTITUTE FOR BIOMEDICAL INNOVATION (US) 2025-09-04 — — US claimed
US-20250241113-A1 FILM, OPTOELECTRONIC DEVICE, AND DISPLAY DEVICE TCL TECHNOLOGY GROUP CORPORATION (CN) 2025-07-24 — — US claimed
EP-2312943-B1 METHOD FOR ASSESSING VIABLE CELLS AND THE USE OF N-(7-DIMETHYLAMINO-4-METHYL-3-COUMARINYL)-MALEIMIDE (DACM) OR N-(9-ACRIDINYL)MALEIMIDE (NAM) FOR ASSESSMENT OF APOPTOSIS. CHEMOMETEC AS (DK) 2019-11-06 — — EP claimed
US-10453420-B2 Base film, laminated structure including the same, and display device LG CHEM, LTD. (KR) 2019-10-22 — — US claimed
CN-104871118-B Basement membrane includes the laminar structure and display device of the basement membrane LG化学株式会社 2017-07-18 — — CN claimed
US-20150299841-A1 BASE FILM, LAMINATED STRUCTURE INCLUDING THE SAME, AND DISPLAY DEVICE LG CHEM, LTD. (KR) 2015-10-22 — — US claimed
US-9128097-B2 Method and kit for assessing viable cells CHEMOMETEC A/S (DK) 2015-09-08 — — US claimed
CN-104871118-A BASE FILM, AND LAMINATED STRUCTURE AND DISPLAY DEVICE COMPRISING SAME LG CHEMICAL LTD 2015-08-26 — — CN claimed
CN-103298841-B Photosensitive resin composition, and dielectric insulating film and electronic device using the same ROHM & HAAS ELECT MAT 2015-02-04 — — CN claimed
CN-103298841-A Photosensitive resin composition, and dielectric insulating film and electronic device using the same ROHM & HAAS ELECT MAT 2013-09-11 — — CN claimed
CN-101174089-B Radiation sensitive resin composition for forming space body, space body and its forming method JSR CORP 2013-07-03 — — CN claimed
WO-2012064074-A1 PHOTOSENSITIVE RESIN COMPOSITION, AND DIELECTRIC INSULATING FILM AND ELECTRONIC DEVICE USING THE SAME ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2012-05-18 — — WO claimed
CN-1898605-B Radiation-sensitive resin composition, interlayer insulating film, microlens, and method for producing the same JSR CORP 2010-08-18 — — CN claimed
US-7713680-B2 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR CORPORATION (JP) 2010-05-11 — — US claimed
CN-100576075-C Partition forms with radiation sensitive resin composition, partition and forming method thereof and liquid crystal display cells JSR CORP 2009-12-30 — — CN claimed
US-20090191386-A1 POSITIVE PHOTOSENSITIVE POLYMER COMPOSITION CHISSO CORPORATION (JP) 2009-07-30 — — US claimed
CN-100428027-C Radiation sensitive resin composition for forming partition, its forming method and liquid crystal display device JSR CO LTD (JP) 2008-10-22 — — CN claimed
US-20080233515-A1 RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE JSR CORPORATION (JP) 2008-09-25 — — US claimed
EP-1972673-A1 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR Corporation (JP) 2008-09-24 — — EP claimed
US-20080207807-A1 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION CHISSO CORPORATION (JP) 2008-08-28 — — US claimed
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