SCHEMBL7225540

SCHEMBL7225540

Nc1ccc2c(c1)C(=O)c1cccc(N)c1-2

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.66
SMN1; SMN2 Q16637 5/20 0.66
MAPK1 P28482 5/20 0.66
RAB9A P51151 4/20 0.66
NPC1 O15118 3/20 0.66
TSHR P16473 3/20 0.66
TDP1 Q9NUW8 3/20 0.66
CYP3A4 P08684 2/20 0.66
TP53 P04637 1/20 0.66
PTPRC P08575 3/20 0.63
ADORA2A P29274 3/20 0.58
LMNA P02545 3/20 0.58
MEN1 O00255 3/20 0.58
POLB P06746 3/20 0.58
KMT2A Q03164 3/20 0.58
NPSR1 Q6W5P4 3/20 0.58
HPGD P15428 2/20 0.58
HTT P42858 2/20 0.58
PPARG P37231 2/20 0.58
NCOA2 Q15596 2/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27414025 0.98 ALDH1A1 (0.63) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL6945771 0.96 PTPRC (0.69) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL8773084 0.91 ADORA2A (0.72) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL30377911 0.91 ADORA2A (0.72) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL4444783 0.91 ADORA2A (0.72) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL29361856 0.91 ADORA2A (0.72) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL1143189 0.82 PTPRC (0.91) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL8662769 0.81 NPC1 (0.59) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL28314104 0.80 MAOA (0.67) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1
SCHEMBL28314083 0.80 MAOA (0.67) ALDH1A1SMN1; SMN2MAPK1RAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6627377-B1 Soluble in organic solvents, which excels in adhesiveness, heat resistance, mechanical properties and flexibility, which shows properties of alkali-soluble highly sensitive positive-type photoresist PI R&D CO., LTD. (JP) 2003-09-30 US disclosed
EP-1024407-A1 POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION PI R & D Co Ltd (JP) 2000-08-02 EP disclosed