SCHEMBL7252803

SCHEMBL7252803

C=C(C)C(=O)OC(CCC)Oc1ccccc1.C=C(C)C(=O)OC1(CC)CCCC1.C=Cc1ccccc1O

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CTSL P07711 3/20 0.32
CTSB P07858 3/20 0.32
CTSK P43235 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7523921 0.90 CTSK (0.35) CTSLCTSBCTSK
SCHEMBL7251880 0.89 KDM4E (0.30)
SCHEMBL2773963 0.85 MAPT (0.35) CTSLCTSBCTSK
SCHEMBL7269137 0.84 LMNA (0.34) CTSLCTSBCTSK
SCHEMBL7257971 0.83
Styrene SCHEMBL6858832 0.82 MEN1 (0.32) CTSLCTSBCTSK
SCHEMBL7252956 0.82 CTSK (0.37) CTSLCTSBCTSK
SCHEMBL5373653 0.79
SCHEMBL7521250 0.78 APOBEC3A (0.36) CTSLCTSBCTSK
SCHEMBL28601849 0.78 CNR1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6641975-B2 Ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate; enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-04 US disclosed