SCHEMBL7252816

SCHEMBL7252816

C=C(C)C(=O)OC(C)Oc1ccc(C)cc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.43
KMT2A Q03164 4/20 0.41
MEN1 O00255 1/20 0.41
MAPT P10636 3/20 0.39
ALDH1A1 P00352 1/20 0.39
NLRP1 Q9C000 1/20 0.39
ELANE P08246 1/20 0.37
POLB P06746 1/20 0.37
PPARG P37231 2/20 0.36
PPARA Q07869 2/20 0.36
NPSR1 Q6W5P4 1/20 0.36
SCN5A Q14524 1/20 0.35
SCN2A Q99250 1/20 0.35
TSHR P16473 1/20 0.35
PARP10 Q53GL7 1/20 0.35
ATM Q13315 1/20 0.35
ADORA3 P0DMS8 1/20 0.34
ADORA2A P29274 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7564773 0.93 ELANE (0.41) KMT2AMAPTALDH1A1ELANEPOLB
SCHEMBL10870371 0.87 ELANE (0.51) LMNAKMT2AMEN1MAPTALDH1A1
SCHEMBL11662636 0.85 PARP10 (0.38) KMT2AMAPTALDH1A1ELANEPOLB
SCHEMBL2029289 0.85 CYP1A2 (0.42) LMNAKMT2AMEN1MAPTPOLB
SCHEMBL548113 0.85 RAB9A (0.40) KMT2AMEN1MAPTALDH1A1ELANE
SCHEMBL21370 0.85 MTNR1A (0.45) LMNAKMT2AMEN1MAPTALDH1A1
SCHEMBL59814 0.84 AR (0.39) KMT2AMEN1MAPTALDH1A1ELANE
SCHEMBL8674500 0.84 KMT2A (0.57) KMT2AMAPTALDH1A1ELANEPOLB
SCHEMBL4161347 0.84 POLB (0.45) KMT2AMAPTELANEPOLBPPARG
SCHEMBL20432967 0.83 LMNA (0.43) LMNAKMT2AMEN1MAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6641975-B2 Ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate; enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-04 US disclosed
US-20020039701-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-04 US disclosed
EP-0321618-B1 PHOTOSENSITIVE HARDENABLE COMPOSITIONS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1993-02-17 EP disclosed
US-4885229-A CONTAINING ACRYLATED ESTERS 501 DAICEL CHEMICAL INDUSTRIES LTD. (JP) 1989-12-05 US disclosed
EP-0321618-A1 Photosensitive hardenable compositions DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1989-06-28 EP disclosed