Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.58 |
| ▸ | CA4 | P22748 | 3/20 | 0.58 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.48 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.48 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.47 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA6 | P23280 | 2/20 | 0.46 |
| ▸ | TPMT | P51580 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | ERN1 | O75460 | 1/20 | 0.39 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.39 |
| ▸ | MGAM | O43451 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6360419 | 0.82 | CA2 (0.64) | CA2CA4ALOX15ALOX12ALOX5 | |
| SCHEMBL21611901 | 0.81 | ALOX5 (0.42) | CA2CA4ALOX15ALOX12ALOX5 | |
| SCHEMBL12678887 | 0.78 | CA2 (0.46) | CA2CA4ALOX15ALOX12ALOX5 | |
| SCHEMBL18893094 | 0.77 | CRHBP (0.50) | CA2CA4ALOX15ALOX12ALOX5 | |
| SCHEMBL5881501 | 0.77 | ERN1 (0.53) | CA2CA4CA1TPMTHPGD | |
| SCHEMBL28647762 | 0.75 | CA2 (0.75) | CA2CA4ALOX15ALOX12CA1 | |
| SCHEMBL29726739 | 0.74 | CA2 (0.60) | CA2CA4ALOX15ALOX12CA1 | |
| SCHEMBL9635966 | 0.74 | CA2 (0.60) | CA2CA4ALOX15ALOX12CA1 | |
| SCHEMBL69904 | 0.74 | CA1 (0.67) | CA2CA4ALOX15ALOX12ALOX5 | |
| SCHEMBL6814356 | 0.74 | GPR35 (0.46) | CA2CA4CA1TPMTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8575239-B2 | Curing composition and cured product prepared by using the same | LG CHEM, LTD. (KR) | 2013-11-05 | — | — | US | claimed |
| JP-2011525198-A | — | — | 2011-09-15 | — | — | JP | claimed |
| US-20100286302-A1 | CURING COMPOSITION AND CURED PRODUCT PREPARED BY USING THE SAME | SHANJIN OPTOELECTRONICS (SUZHOU) CO., LTD. (CN) | 2010-11-11 | — | — | US | claimed |
| EP-2231781-A2 | CURING COMPOSITION AND CURED PRODUCT PREPARED BY USING THE SAME | LG Chem, Ltd. (KR) | 2010-09-29 | — | — | EP | claimed |
| WO-2009084861-A2 | CURING COMPOSITION AND CURED PRODUCT PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2009-07-09 | — | — | WO | claimed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11720018-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-11720018-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| WO-2020007882-A1 | M-GUAIACOL DERIVATIVES, PREPARATION THEREOF, AND USES THEREOF | UNIVERSITE DE CAEN NORMANDIE (FR) | 2020-01-09 | — | — | WO | disclosed |
| US-8575239-B2 | Curing composition and cured product prepared by using the same | LG CHEM, LTD. (KR) | 2013-11-05 | — | — | US | disclosed |
| EP-2231781-B1 | CURING COMPOSITION AND CURED PRODUCT PREPARED BY USING THE SAME | LG CHEMICAL LTD (KR) | 2012-09-26 | — | — | EP | disclosed |
| US-20100286302-A1 | CURING COMPOSITION AND CURED PRODUCT PREPARED BY USING THE SAME | SHANJIN OPTOELECTRONICS (SUZHOU) CO., LTD. (CN) | 2010-11-11 | — | — | US | disclosed |
| EP-2231781-A2 | CURING COMPOSITION AND CURED PRODUCT PREPARED BY USING THE SAME | LG Chem, Ltd. (KR) | 2010-09-29 | — | — | EP | disclosed |
| WO-2009084861-A2 | CURING COMPOSITION AND CURED PRODUCT PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2009-07-09 | — | — | WO | disclosed |