SCHEMBL731016

SCHEMBL731016

c1cc(COCC2CO2)ccc1COCC1CO1

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.48
TDP1 Q9NUW8 2/20 0.45
LMNA P02545 1/20 0.45
ALDH1A1 P00352 6/20 0.44
TP53 P04637 3/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
HIF1A Q16665 2/20 0.44
CYP3A4 P08684 1/20 0.44
MAPK1 P28482 1/20 0.43
GLA P06280 1/20 0.41
TAAR1 Q96RJ0 1/20 0.41
MGLL Q99685 2/20 0.40
MAPT P10636 2/20 0.39
HPGD P15428 2/20 0.39
MEN1 O00255 1/20 0.39
CYP1A2 P05177 1/20 0.39
KMT2A Q03164 1/20 0.39
PPARG P37231 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12172323 0.94 MGLL (0.47) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL21863346 0.94 MGLL (0.47) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL18876519 0.92 TSHR (0.42) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL9234674 0.90 AGXT (0.44) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL10364352 0.90 TSHR (0.41) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL10439431 0.90 TAAR1 (0.43) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL7236774 0.90 IDO1 (0.44) TSHRLMNAALDH1A1GLA
SCHEMBL21715829 0.90 SMN1; SMN2 (0.44) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL2412299 0.90 IDO1 (0.44) TSHRTDP1LMNAALDH1A1TP53
SCHEMBL6631882 0.90 IDO1 (0.44) TSHRTDP1LMNAALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117986296-A Degradable flame-retardant epoxy resin precursor, composition, preparation method and application thereof 中国科学院宁波材料技术与工程研究所 2024-05-07 CN claimed
CN-114349951-B Functional water-based flash rust inhibitor and preparation method thereof 中国科学院金属研究所 2023-03-10 CN claimed
CN-114525072-A Polyethers containing cyclic groups other than bisphenols 宣伟投资管理有限公司 2022-05-24 CN claimed
CN-114349951-A Functional water-based flash rust inhibitor and preparation method thereof 中国科学院金属研究所 2022-04-15 CN claimed
US-20200317953-A1 POLYETHERS CONTAINING NON-BISPHENOLIC CYCLIC GROUPS SWIMC LLC (US) 2020-10-08 US claimed
EP-2788398-B1 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF SUN CHEMICAL CORP (US) 2018-07-25 EP claimed
CN-104039862-B Sulfide-extended epoxy resin and application of barrier coating thereof 太阳化学公司 2017-12-22 CN claimed
US-9624380-B2 Sulfide extended epoxy resins and barrier coating applications thereof SUN CHEMICAL CORPORATION (US) 2017-04-18 US claimed
EP-3146009-A1 POLYETHERS CONTAINING NON-BISPHENOLIC CYCLIC GROUPS Valspar Sourcing, Inc. (US) 2017-03-29 EP claimed
US-20170051177-A1 POLYETHERS CONTAINING NON-BISPHENOLIC CYCLIC GROUPS SWIMC LLC 2017-02-23 US claimed
WO-2015179064-A1 POLYETHERS CONTAINING NON-BISPHENOLIC CYCLIC GROUPS VALSPAR SOURCING, INC. (US) 2015-11-26 WO claimed
US-20140370220-A1 OVERPRINT VARNISHES WITH NON-AQUOUS DISPERSIONS SUN CHEMICAL CORPORATION (US) 2014-12-18 US claimed
US-20140342091-A1 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATING APPLICATIONS THEREOF SUN CHEMICAL CORPORATION (US) 2014-11-20 US claimed
EP-2788398-A2 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF Sun Chemical Corporation (US) 2014-10-15 EP claimed
WO-2013090702-A2 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF SUN CHEMICAL CORPORATION (US) 2013-06-20 WO claimed
US-12547072-B2 Self-aligned build-up processing GEMINATIO, INC. (US) 2026-02-10 US disclosed
EP-4681503-A1 MICROWAVE-INDUCED EXOTHERMIC COMPOSITION, MICROWAVE-INDUCED EXOTHERMIC FILM, MICROWAVE-INDUCED EXOTHERMIC PACKAGE, AND METHOD FOR PRODUCING MICROWAVE-INDUCED EXOTHERMIC FILM Ricoh Company, Ltd. (JP) 2026-01-21 EP disclosed
US-20060062958-A1 Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof SHIN-ETSU POLYMER CO., LTD (JP) 2006-03-23 US disclosed
US-20050215757-A1 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2005-09-29 US disclosed
EP-1482002-A1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS, INC. (JP) 2004-12-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12547072-B2 Self-aligned build-up processing MYBBP1A, SMURF1, MYB TSHR 2540/4885TDP1 2362/4885LMNA 1133/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.