Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL731269 | 0.80 | GAA (0.34) | GAAALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL3890198 | 0.78 | GAA (0.33) | GAA | |
| SCHEMBL1051442 | 0.78 | — | — | |
| SCHEMBL707980 | 0.73 | ALDH1A1 (0.37) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL704793 | 0.73 | ALDH1A1 (0.37) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL31176229 | 0.72 | ALDH1A1 (0.38) | GAAALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL4630637 | 0.71 | TGFBR1 (0.33) | — | |
| SCHEMBL131295 | 0.70 | ALDH1A1 (0.41) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL4636526 | 0.69 | ALDH1A1 (0.33) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL15662885 | 0.69 | ALDH1A1 (0.33) | ALDH1A1LMNAHSD17B10TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8697561-B2 | Microelectronic structure by selective deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-04-15 | — | — | US | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-20120142182-A1 | MICROELECTRONIC STRUCTURE BY SELECTIVE DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-07 | — | — | US | disclosed |
| US-8138100-B2 | Microelectronic structure by selective deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-20 | — | — | US | disclosed |
| CN-1757445-B | Composition for preparing low dielectric material containing solvent | AIR PROD & CHEM | 2010-12-01 | — | — | CN | disclosed |
| US-7816743-B2 | Microelectronic structure by selective deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-10-19 | — | — | US | disclosed |
| US-20100041234-A1 | Process For Restoring Dielectric Properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| US-20090298671-A1 | Compositions for Preparing Low Dielectric Materials Containing Solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| CN-100539037-C | The composition of preparation low dielectric material | AIR PROD & CHEM (US) | 2009-09-09 | — | — | CN | disclosed |
| US-7510939-B2 | Microelectronic structure by selective deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-31 | — | — | US | disclosed |
| EP-1583141-A2 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-10-05 | — | — | EP | disclosed |
| EP-1577935-A2 | Compositions for preparing low dielectric materials containing solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-09-21 | — | — | EP | disclosed |
| US-20050196974-A1 | Compositions for preparing low dielectric materials containing solvents | VERSUM MATERIALS US, LLC | 2005-09-08 | — | — | US | disclosed |
| US-20050196535-A1 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2005-09-08 | — | — | US | disclosed |
| EP-1561841-A2 | Cleaning CVD Chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-08-10 | — | — | EP | disclosed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |
| CN-1487567-A | Composition for producing low dielectric material | �����Ʒ�뻯ѧ��˾ | 2004-04-07 | — | — | CN | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |