Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.37 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704685 | 0.88 | KDM4E (0.36) | ALDH1A1TSHRLMNAHSD17B10KDM4E | |
| SCHEMBL703686 | 0.88 | KDM4E (0.36) | ALDH1A1TSHRLMNAHSD17B10KDM4E | |
| SCHEMBL12898581 | 0.87 | — | — | |
| SCHEMBL303979 | 0.86 | KDM4E (0.40) | ALDH1A1TSHRLMNAHSD17B10KDM4E | |
| SCHEMBL229663 | 0.86 | ALDH1A1 (0.38) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL11464462 | 0.84 | TRPA1 (0.35) | ALDH1A1TSHRLMNAHSD17B10 | |
| SCHEMBL6390821 | 0.84 | PAOX (0.37) | ALDH1A1TSHRLMNAHSD17B10 | |
| SCHEMBL11455842 | 0.84 | ALDH1A1 (0.31) | ALDH1A1TSHRLMNAHSD17B10 | |
| SCHEMBL11211035 | 0.84 | ALDH1A1 (0.31) | ALDH1A1TSHRLMNAHSD17B10 | |
| SCHEMBL5692043 | 0.84 | ALDH1A1 (0.31) | ALDH1A1TSHRLMNAHSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1198616-B1 | ACYLOXY SILANE TREATMENTS FOR METALS | UNIV CINCINNATI (US) | 2005-11-16 | — | — | EP | claimed |
| US-6955728-B1 | Acyloxy silane treatments for metals | UNIVERSITY OF CINCINNATI (US) | 2005-10-18 | — | — | US | claimed |
| EP-4549504-A1 | METHOD FOR THE DEPOLYMERIZATION OF SILICONE | Universität Hamburg (DE) | 2025-05-07 | — | — | EP | disclosed |
| US-20240228306-A9 | DISPERSION OF EXFOLIATED PARTICLES OF LAYERED POLYSILICATE COMPOUND, AND METHOD FOR PRODUCING SAME | NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240213072-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240199924-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-20240132365-A1 | DISPERSION OF EXFOLIATED PARTICLES OF LAYERED POLYSILICATE COMPOUND, AND METHOD FOR PRODUCING SAME | NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY (JP) | 2024-04-25 | — | — | US | disclosed |
| US-11966164-B2 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20240069441-A1 | COMPOSITION FOR RESIST UNDERLYING FILM FORMATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-20100291487-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UREA GROUP | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-7141306-B1 | Sol-gel composition and process for coating aerospace alloys | CESSNA AIRCRAFT COMPANY (US) | 2006-11-28 | — | — | US | disclosed |
| EP-1198616-B1 | ACYLOXY SILANE TREATMENTS FOR METALS | UNIV CINCINNATI (US) | 2005-11-16 | — | — | EP | disclosed |
| US-6955728-B1 | Acyloxy silane treatments for metals | UNIVERSITY OF CINCINNATI (US) | 2005-10-18 | — | — | US | disclosed |
| EP-1198616-A1 | ACYLOXY SILANE TREATMENTS FOR METALS | THE UNIVERSITY OF CINCINNATI (US) | 2002-04-24 | — | — | EP | disclosed |
| WO-2001006036-A1 | ACYLOXY SILANE TREATMENTS FOR METALS | UNIVERSITY OF CINCINNATI (GB) | 2001-01-25 | — | — | WO | disclosed |