SCHEMBL740619

SCHEMBL740619

Cc1ccc(S(=O)(=O)NS(C)(=O)=O)c(C)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.54
HPGD P15428 2/20 0.54
MAPT P10636 2/20 0.54
POLB P06746 1/20 0.54
ALOX12 P18054 1/20 0.54
GFER P55789 1/20 0.54
KMT2A Q03164 2/20 0.53
MEP1B Q16820 1/20 0.51
LMNA P02545 4/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
PKM P14618 1/20 0.49
MAPK1 P28482 1/20 0.49
HTT P42858 1/20 0.49
HSD17B10 Q99714 1/20 0.48
MEN1 O00255 1/20 0.47
MAP1LC3B Q9GZQ8 1/20 0.47
GAA P10253 1/20 0.46
BRD4 O60885 1/20 0.46
BRPF1 P55201 1/20 0.46
MCL1 Q07820 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29727498 0.85 EDNRB (0.56) ALDH1A1HPGDMAPTPOLBKMT2A
SCHEMBL21923052 0.85 EDNRB (0.56) ALDH1A1HPGDMAPTPOLBKMT2A
SCHEMBL12125109 0.82 EDNRB (0.41) ALDH1A1HPGDMAPTPOLBALOX12
SCHEMBL14934294 0.80 ALDH1A1 (0.57) ALDH1A1HPGDMAPTPOLBALOX12
SCHEMBL11475986 0.78 ALDH1A1 (0.56) ALDH1A1HPGDMAPTPOLBALOX12
SCHEMBL31349695 0.78 ALDH1A1 (0.56) ALDH1A1HPGDMAPTPOLBALOX12
SCHEMBL4396839 0.77 L3MBTL1 (0.63) ALDH1A1HPGDMAPTPOLBALOX12
SCHEMBL16261204 0.77 ALDH1A1 (0.54) ALDH1A1HPGDMAPTPOLBALOX12
SCHEMBL28237647 0.76 EDNRA (0.54) ALDH1A1HPGDMAPTPOLBKMT2A
SCHEMBL11963336 0.76 MEP1B (0.62) ALDH1A1HPGDMAPTPOLBALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652759-B2 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer EASTMAN KODAK COMPANY (US) 2014-02-18 US disclosed
EP-1849600-B1 Bakeable radiation-sensitive elements with a high resistance to chemicals EASTMAN KODAK CO (US) 2013-12-11 EP disclosed
CN-102483588-B Method and apparatus for drying after a single-step process of lithographic printing plates EASTMAN KODAK CO 2013-09-11 CN disclosed
US-8507181-B2 Method for developing and sealing of lithographic printing plates KODAK (NEAR EAST) INC. 2013-08-13 US disclosed
EP-1917141-B1 DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER KODAK GRAPHIC COMM GMBH (DE) 2012-12-12 EP disclosed
EP-2293144-B1 Method of drying lithographic printing plates after single-step-processing EASTMAN KODAK CO (US) 2012-11-07 EP disclosed
US-20120152139-A1 METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES QUALEX INC. 2012-06-21 US disclosed
CN-102483588-A Method and apparatus for drying after a single-step process of lithographic printing plates EASTMAN KODAK CO 2012-05-30 CN disclosed
EP-2284005-B1 Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers EASTMAN KODAK CO (US) 2012-05-02 EP disclosed
US-8137891-B2 Bakeable lithographic printing plates with a high resistance to chemicals EASTMAN KODAK COMPANY (US) 2012-03-20 US disclosed
EP-1673222-A1 PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS Kodak Polychrome Graphics GmbH (DE) 2006-06-28 EP disclosed
WO-2005123412-A1 MODIFIED POLYMERS AND THEIR USE IN THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATE PRECURSORS KODAK POLYCHROME GRAPHICS GMBH (DE) 2005-12-29 WO disclosed
WO-2005039878-A1 PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS KODAK POLYCHROME GRAPHICS GMBH (DE) 2005-05-06 WO disclosed
EP-0938413-B1 RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES KODAK POLYCHROME GRAPHICS CO (US) 2004-03-03 EP disclosed
US-6677106-B2 WIDENS THE WINDOW OF OPERATION OF STANDARD USED PATTERNING COMPOSITIONS USED IN MAKING THERMALLY SENSITIVE PRINTING PLATES USING A FLOOD EXPOSURE METHOD KODAK POLYCHROME GRAPHICS LLC 2004-01-13 US disclosed
US-20030157429-A1 Providing patterning formulation layer; imagewise exposing to actinic radiation; treating layer with heat energy to treat imaged portions; flood exposing with ultraviolet light; developing; with an aqueous alkaline developer to remove KODAK POLYCHROME GRAPHICS LLC, A CORPORATION OF THE STATE OF CONNECTICUT. 2003-08-21 US disclosed
US-6599676-B2 Patterning composition layer on a substrate, said patterning composition comprising: at least one acid generator which is sensitive to UV radiation; at least one cross-linking resin or compound; at least one binder resin comprising a polymer KODAK POLYCHROME GRAPHICS LLC 2003-07-29 US disclosed
US-20030124454-A1 Patterning composition layer on a substrate, said patterning composition comprising: at least one acid generator which is sensitive to UV radiation; at least one cross-linking resin or compound; at least one binder resin comprising a polymer KODAK POLYCHROME GRAPHICS LLC 2003-07-03 US disclosed
US-6451502-B1 manufacture of electronic parts KODAK POLYCHROME GRAPHICS LLC 2002-09-17 US disclosed
US-5919601-A COMPRISING THERMAL-ACTIVATED ACID GENERATOR, CROSSLINKING RESIN, BINDER RESIN CONTAINING PENDANT GROUPS CAPABLE OF UNDERGOING ACID-CATALYZED CONDENSATION WITH CROSSLINKING RESIN, INFRARED ABSORBER KODAK POLYCHROME GRAPHICS, LLC (US) 1999-07-06 US disclosed