SCHEMBL21923052

SCHEMBL21923052

Cc1ccc(C)c(S(=O)(=O)NS(C)(=O)=O)c1

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
EDNRB P24530 2/20 0.56
EDNRA P25101 2/20 0.56
ALDH1A1 P00352 8/20 0.54
GAA P10253 3/20 0.54
TSHR P16473 2/20 0.54
LMNA P02545 3/20 0.51
SMN1; SMN2 Q16637 2/20 0.51
HPGD P15428 1/20 0.51
HTT P42858 1/20 0.50
TDP1 Q9NUW8 1/20 0.48
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
CYP2C19 P33261 1/20 0.47
POLB P06746 1/20 0.47
G6PD P11413 1/20 0.47
MAPT P10636 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29727498 1.00 EDNRB (0.56) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL740619 0.85 ALDH1A1 (0.54) ALDH1A1GAALMNASMN1; SMN2HPGD
SCHEMBL12125109 0.82 EDNRB (0.41) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL8018706 0.81 GAA (0.51) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL17319217 0.80 LMNA (0.69) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL21923053 0.79 TDP1 (0.54) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL1868303 0.78 ALDH1A1 (0.56) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL15880801 0.78 ALDH1A1 (0.60) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL11520340 0.78 LMNA (0.67) EDNRBEDNRAALDH1A1GAATSHR
SCHEMBL11520351 0.78 LMNA (0.72) EDNRBEDNRAALDH1A1GAATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3644122-B1 NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2020-12-30 EP disclosed
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-04-30 US disclosed
EP-3644122-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2020-04-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SLC6A5, SLC11A2, LARP7 EDNRB 492/4885EDNRA 788/4885ALDH1A1 4692/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.