SCHEMBL742860

SCHEMBL742860

c1cc(N(CC2CC2)CC2CO2)ccc1OCC1CO1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.50
ALDH1A1 P00352 4/20 0.48
TP53 P04637 3/20 0.48
TSHR P16473 3/20 0.48
LMNA P02545 3/20 0.48
MAPT P10636 2/20 0.48
HPGD P15428 2/20 0.48
HIF1A Q16665 2/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
PKM P14618 2/20 0.48
CYP1A2 P05177 1/20 0.48
PPARG P37231 1/20 0.48
GAA P10253 1/20 0.48
SMN1; SMN2 Q16637 3/20 0.45
CYP3A4 P08684 1/20 0.45
GLA P06280 1/20 0.36
APP P05067 1/20 0.36
PARP15 Q460N3 1/20 0.35
PARP10 Q53GL7 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12002403 0.92 TDP1 (0.58) TDP1ALDH1A1TP53TSHRLMNA
SCHEMBL15246779 0.92 TDP1 (0.58) TDP1ALDH1A1TP53TSHRLMNA
SCHEMBL27630 0.92 TDP1 (0.58) TDP1ALDH1A1TP53TSHRLMNA
SCHEMBL13811429 0.92 TDP1 (0.58) TDP1ALDH1A1TP53TSHRLMNA
SCHEMBL14524359 0.91 TDP1 (0.45) TDP1ALDH1A1TP53TSHRLMNA
Water SCHEMBL936895 0.91 TDP1 (0.56) TDP1ALDH1A1TP53TSHRLMNA
SCHEMBL21630227 0.88 TDP1 (0.53) TDP1ALDH1A1TP53TSHRLMNA
SCHEMBL21630218 0.88 TDP1 (0.53) TDP1ALDH1A1TP53TSHRLMNA
SCHEMBL21630232 0.85 TDP1 (0.50) TDP1ALDH1A1TP53TSHRLMNA
Ether SCHEMBL936894 0.84 ALDH1A1 (0.50) TDP1ALDH1A1TP53TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11731932-B2 Silicon-containing compositions and their methods of use ADITYA BIRLA CHEMICALS (USA), INC. (US) 2023-08-22 US disclosed
US-20160311970-A1 INSERTION POLYNORBORNENE-BASED THERMOSET RESINS CLAVERIE, Jérôme (CA) 2016-10-27 US disclosed
US-9376560-B2 Matrix material HONDA MOTOR CO., LTD. (JP) 2016-06-28 US disclosed
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-20150005458-A1 MATRIX MATERIAL HONDA MOTOR CO., LTD. (JP) 2015-01-01 US disclosed
US-8889802-B2 Polymer compositions and methods of making and using same POLYMERIGHT, INC. (US) 2014-11-18 US disclosed
US-8846295-B2 Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-09-30 US disclosed
US-20140072915-A1 PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-13 US disclosed
US-20130288178-A1 PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-10-31 US disclosed
US-20130157463-A1 NEAR-INFRARED ABSORBING FILM COMPOSITION FOR LITHOGRAPHIC APPLICATION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 US disclosed
US-20120130040-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2012-05-24 US disclosed
US-8138278-B2 Polymer compositions and methods of making and using same POLYMERIGHT, INC. (US) 2012-03-20 US disclosed
US-20110152492-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2011-06-23 US disclosed
US-20070092776-A1 Sulfonic acid group-containing organic-silica composite membrane and method for producing thereof EBARA CORPORATION (JP) 2007-04-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11731932-B2 Silicon-containing compositions and their methods of use SRM, REV1, RER1 TDP1 1831/4885ALDH1A1 3388/4885TP53 2079/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.