Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4401640 | 0.89 | TSHR (0.30) | — | |
| SCHEMBL4403860 | 0.87 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL4403094 | 0.86 | TSHR (0.35) | — | |
| SCHEMBL4399246 | 0.85 | TSHR (0.35) | — | |
| SCHEMBL439022 | 0.84 | HSD11B1 (0.32) | — | |
| SCHEMBL12190120 | 0.83 | — | — | |
| SCHEMBL27397599 | 0.83 | — | — | |
| SCHEMBL4903389 | 0.83 | HSD11B1 (0.31) | ALDH1A1 | |
| SCHEMBL15182742 | 0.83 | — | — | |
| SCHEMBL19223214 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 549 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3616878-B1 | EXTRUDED RESIN PLATE AND MANUFACTURING METHOD THEREOF | KURARAY CO (JP) | 2024-12-18 | — | — | EP | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-3659802-B1 | LAYERED/EXTRUDED RESIN SHEET, AND PROTECTIVE SHEET FOR LIQUID CRYSTAL DISPLAY WITH INFRARED SENSOR | KURARAY CO (JP) | 2023-07-12 | — | — | EP | disclosed |
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | INHA INDUSTRY PARTNERSHIP INSTITUTE (KR) | 2023-06-08 | — | — | US | disclosed |
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | INHA INDUSTRY PARTNERSHIP INSTITUTE (KR) | 2023-06-08 | — | — | US | disclosed |
| US-20230174688-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-08 | — | — | US | disclosed |
| CN-111983745-B | Optical film, polarizing plate and liquid crystal display device | 柯尼卡美能达株式会社 | 2022-10-21 | — | — | CN | disclosed |
| CN-111983744-B | Optical film and method for producing optical film | 柯尼卡美能达株式会社 | 2022-06-10 | — | — | CN | disclosed |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| EP-1004568-B1 | Novel ester compounds, polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-6946233-B2 | High resolution; etching chemical resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-09-20 | — | — | US | disclosed |
| US-20050079440-A1 | Novel polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-6703183-B2 | (METH)ACRYLIC ACID ADAMANTANE OR NORBORNANE ESTER DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-09 | — | — | US | disclosed |
| US-20030091929-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030054290-A1 | Polymer, resist material and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-20 | — | — | US | disclosed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | PARP10, ADCY10, APRT | ALDH1A1 83/4885 |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | PHOSPHO1, RER1, RIF1 | ALDH1A1 3361/4885 |
| US-20230174688-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER | MCCC2, MMAB, INTS9 | ALDH1A1 1392/4885 |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | PYM1, MMAB, MEN1 | ALDH1A1 1455/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.