SCHEMBL7458021

SCHEMBL7458021

Nc1ccc(-c2nc3cccc([S+]([O-])c4cccc5nc(-c6ccc(N)cc6)[nH]c45)c3[nH]2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 8/20 0.53
▸ ALDH1A1 P00352 8/20 0.53
▸ MAPT P10636 7/20 0.53
▸ KDM4E B2RXH2 7/20 0.53
▸ NPC1 O15118 7/20 0.53
▸ HPGD P15428 7/20 0.53
▸ RAB9A P51151 6/20 0.53
▸ POLB P06746 5/20 0.53
▸ HSD17B10 Q99714 4/20 0.53
▸ TP53 P04637 4/20 0.53
▸ GFER P55789 3/20 0.53
▸ PARP1 P09874 4/20 0.48
▸ TNKS O95271 3/20 0.48
▸ TNKS2 Q9H2K2 3/20 0.48
▸ MEN1 O00255 7/20 0.45
▸ KMT2A Q03164 7/20 0.45
▸ GAA P10253 5/20 0.45
▸ GLA P06280 4/20 0.45
▸ RECQL P46063 2/20 0.45
▸ RXFP1 Q9HBX9 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6439292 0.80 ALDH1A1 (0.60) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
SCHEMBL6325048 0.77 ALDH1A1 (0.57) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
SCHEMBL21776984 0.77 ALDH1A1 (0.57) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
SCHEMBL7458011 0.77 PARP1 (0.57) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
SCHEMBL28241148 0.70 ALDH1A1 (0.58) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
SCHEMBL222131 0.69 ALDH1A1 (1.00) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
SCHEMBL1895948 0.68 NPC1 (0.55) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
Fluoride SCHEMBL31379729 0.68 ALDH1A1 (0.96) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
Methane SCHEMBL28366167 0.68 ALDH1A1 (0.96) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1
SCHEMBL11443276 0.68 RPS6KA3 (0.59) SMN1; SMN2ALDH1A1MAPTKDM4ENPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6482569-B1 Process for forming a polyimide pattern with photosensitive composition for i-line stepper ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-11-19 — — US disclosed
EP-0718696-B1 Photosensitive polyimide precursor composition ASAHI CHEMICAL IND (JP) 2002-01-16 — — EP disclosed
US-6162580-A Photosensitive polyimide precursor compositions processable by exposure to short wavelength light ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-12-19 — — US disclosed
EP-0580108-B1 A photosensitive polyimide composition ASAHI CHEMICAL IND (JP) 1997-03-12 — — EP disclosed
EP-0718696-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1996-06-26 — — EP disclosed
EP-0580108-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1994-01-26 — — EP disclosed
Send feedback