SCHEMBL7459148

SCHEMBL7459148

Nc1ccc(-c2ccc(S(=O)(=O)c3ccc(N)cc3)cc2)cc1

nearest known ligand 0.84

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 3/20 0.84
TSHR P16473 3/20 0.84
CYP3A4 P08684 3/20 0.84
LMNA P02545 1/20 0.84
MPO P05164 1/20 0.84
CYP2C9 P11712 1/20 0.84
CA2 P00918 6/20 0.70
CA12 O43570 5/20 0.70
CA9 Q16790 5/20 0.70
CA1 P00915 5/20 0.70
CA14 Q9ULX7 4/20 0.70
MEN1 O00255 1/20 0.67
KMT2A Q03164 1/20 0.67
ALDH1A1 P00352 3/20 0.61
PKM P14618 2/20 0.61
TDP1 Q9NUW8 3/20 0.58
TP53 P04637 1/20 0.58
USP2 O75604 1/20 0.56
CA4 P22748 1/20 0.56
CA6 P23280 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1271136 1.00 HTR6 (0.84) HTR6TSHRCYP3A4LMNAMPO
SCHEMBL14333821 1.00 HTR6 (0.84) HTR6TSHRCYP3A4LMNAMPO
Dapsone SCHEMBL5055312 0.92 HTR6 (1.00) HTR6TSHRCYP3A4LMNAMPO
Dapsone SCHEMBL21428 0.92 HTR6 (1.00) HTR6TSHRCYP3A4LMNAMPO
Dapsone SCHEMBL1219599 0.92 HTR6 (1.00) HTR6TSHRCYP3A4LMNAMPO
SCHEMBL10596934 0.92 HTR6 (1.00) HTR6TSHRCYP3A4LMNAMPO
SCHEMBL324893 0.92 HTR6 (1.00) HTR6TSHRCYP3A4LMNAMPO
Dapsone SCHEMBL9690514 0.89 HTR6 (0.94) HTR6TSHRCYP3A4LMNAMPO
Dapsone SCHEMBL9690505 0.89 HTR6 (0.94) HTR6TSHRCYP3A4LMNAMPO
Dapsone SCHEMBL2203636 0.89 HTR6 (0.94) HTR6TSHRCYP3A4LMNAMPO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6482569-B1 Process for forming a polyimide pattern with photosensitive composition for i-line stepper ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-11-19 US disclosed
EP-0718696-B1 Photosensitive polyimide precursor composition ASAHI CHEMICAL IND (JP) 2002-01-16 EP disclosed
US-6162580-A Photosensitive polyimide precursor compositions processable by exposure to short wavelength light ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-12-19 US disclosed
EP-0580108-B1 A photosensitive polyimide composition ASAHI CHEMICAL IND (JP) 1997-03-12 EP disclosed
EP-0718696-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1996-06-26 EP disclosed
EP-0580108-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1994-01-26 EP disclosed