Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 4/20 | 1.00 |
| ▸ | TSHR | P16473 | 3/20 | 1.00 |
| ▸ | CYP3A4 | P08684 | 2/20 | 1.00 |
| ▸ | LMNA | P02545 | 2/20 | 1.00 |
| ▸ | MPO | P05164 | 1/20 | 1.00 |
| ▸ | CYP2C9 | P11712 | 1/20 | 1.00 |
| ▸ | MEN1 | O00255 | 1/20 | 0.76 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.76 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.70 |
| ▸ | PKM | P14618 | 2/20 | 0.70 |
| ▸ | CA1 | P00915 | 3/20 | 0.65 |
| ▸ | CA2 | P00918 | 3/20 | 0.65 |
| ▸ | CA12 | O43570 | 2/20 | 0.65 |
| ▸ | CA9 | Q16790 | 2/20 | 0.65 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.65 |
| ▸ | USP2 | O75604 | 1/20 | 0.65 |
| ▸ | CA4 | P22748 | 1/20 | 0.65 |
| ▸ | CA6 | P23280 | 1/20 | 0.65 |
| ▸ | CA5A | P35218 | 1/20 | 0.65 |
| ▸ | CA7 | P43166 | 1/20 | 0.65 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dapsone SCHEMBL21428 | 1.00 | HTR6 (1.00) | HTR6TSHRCYP3A4LMNAMPO | |
| SCHEMBL10596934 | 1.00 | HTR6 (1.00) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL5055312 | 1.00 | HTR6 (1.00) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL1219599 | 1.00 | HTR6 (1.00) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL9690514 | 0.97 | HTR6 (0.94) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL11745790 | 0.97 | HTR6 (0.94) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL28520980 | 0.97 | HTR6 (0.94) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL27664082 | 0.97 | HTR6 (0.94) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL2203636 | 0.97 | HTR6 (0.94) | HTR6TSHRCYP3A4LMNAMPO | |
| Dapsone SCHEMBL9690505 | 0.97 | HTR6 (0.94) | HTR6TSHRCYP3A4LMNAMPO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 338 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122074082-A | Polyimide film having improved breakdown characteristics and method for producing same | 聚酰亚胺尖端素材株式会社 | 2026-05-22 | — | — | CN | claimed |
| US-20240218126-A1 | POLYIMIDE MOLDED PRODUCT AND MANUFACTURING METHOD THEREOF | PI ADVANCED MATERIALS CO., LTD. (KR) | 2024-07-04 | — | — | US | claimed |
| EP-4393981-A1 | POLYIMIDE MOLDED PRODUCT AND MANUFACTURING METHOD THEREOF | PI Advanced Materials Co., Ltd. (KR) | 2024-07-03 | — | — | EP | claimed |
| WO-2024117669-A1 | POLYIMIDE VARNISH FOR COATING CONDUCTOR WITH IMPROVED HEAT DISSIPATION FOR COATING CONDUCTOR AND POLYIMIDE COATING MATERIAL COMPRISING THE SAME | PI ADVANCED MATERIALS CO., LTD. (KR) | 2024-06-06 | — | — | WO | claimed |
| WO-2024112104-A1 | POLYIMIDE FILM COMPRISING ADDITIVE AND GRAPHITE SHEET PREPARED BY USING SAME | PI ADVANCED MATERIALS CO., LTD. (KR) | 2024-05-30 | — | — | WO | claimed |
| WO-2024076094-A1 | BLACK POLYIMIDE FILM AND THE MANUFACTURING METHOD THEREOF | PI ADVANCED MATERIALS CO., LTD. (KR) | 2024-04-11 | — | — | WO | claimed |
| US-20240026098-A1 | POLYIMIDE FILM HAVING HIGH DIMENSIONAL STABILITY AND MANUFACTURING METHOD THEREFOR | PI ADVANCED MATERIALS CO., LTD. (KR) | 2024-01-25 | — | — | US | claimed |
| WO-2023243967-A1 | BLACK POLYIMIDE FILM AND MANUFACTURING METHOD THEREOF | PI ADVANCED MATERIALS CO., LTD. (KR) | 2023-12-21 | — | — | WO | claimed |
| WO-2023200191-A1 | MANUFACTURING METHOD OF POLYIMIDE POWDER AND POLYIMIDE POWDER MANUFACTURED BY THE SAME | PI ADVANCED MATERIALS CO., LTD. (KR) | 2023-10-19 | — | — | WO | claimed |
| WO-2023191434-A1 | POLYIMIDE FILM AND MANUFACTURING METHOD THEREFOR | 피아이첨단소재 주식회사 | 2023-10-05 | — | — | WO | claimed |
| EP-2063002-B1 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-11-23 | — | — | EP | claimed |
| EP-1455007-B1 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO LTD (KR) | 2010-06-02 | — | — | EP | claimed |
| EP-2063002-A2 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | Samsung Electronics Co., Ltd. (KR) | 2009-05-27 | — | — | EP | claimed |
| US-20060004180-A1 | Solution compositions of block copolyimides comprising pyromellitic dianhydride and process for production thereof | PI R&D CO., LTD. (JP) | 2006-01-05 | — | — | US | claimed |
| US-6960425-B2 | Method for laminating and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-01 | — | — | US | claimed |
| EP-1561786-A1 | SOLUTION COMPOSITIONS OF BLOCK COPOLYIMIDES COMPRISING PYROMELLITIC DIANHYDRIDE AND PROCESS FOR PRODUCTION THEREOF | PI R & D Co., Ltd. (JP) | 2005-08-10 | — | — | EP | claimed |
| EP-1455007-A2 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-09-08 | — | — | EP | claimed |
| US-20040142285-A1 | Method for laminating and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. | 2004-07-22 | — | — | US | claimed |
| US-6541178-B2 | An sulfonium(-) and iodonium(+)ion-type photoacid generator containing a naphthol structure, and photosensitive polyimide resin using photoacid generator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-04-01 | — | — | US | claimed |
| US-20020048719-A1 | Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same | SAMSUNG ELECTRONICS CO., LTD. | 2002-04-25 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020048719-A1 | Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same | ASIC1, H1-0, RER1 | HTR6 2742/4885TSHR 3446/4885CYP3A4 1426/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.