SCHEMBL7475136

SCHEMBL7475136

Cc1ccc(S(=O)(=O)Oc2c(C)cccc2C(F)C(F)(F)C(F)(F)F)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.38
KMT2A Q03164 5/20 0.38
ESR1 P03372 1/20 0.38
GAA P10253 1/20 0.38
ESR2 Q92731 1/20 0.38
KEAP1 Q14145 1/20 0.36
NFE2L2 Q16236 1/20 0.36
AGER Q15109 1/20 0.35
LMNA P02545 3/20 0.34
MAPK1 P28482 1/20 0.34
HTR6 P50406 1/20 0.33
DHODH Q02127 1/20 0.33
VDR P11473 1/20 0.33
ALDH1A1 P00352 4/20 0.32
FFAR1 O14842 1/20 0.32
CDK1 P06493 1/20 0.32
CCNB1 P14635 1/20 0.32
CCNA2 P20248 1/20 0.32
CDK2 P24941 1/20 0.32
CDK7 P50613 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8501263 0.85 RAPGEF4 (0.37) MEN1KMT2AESR1GAAESR2
SCHEMBL8501647 0.84 LMNA (0.37) MEN1KMT2AESR1GAAESR2
SCHEMBL6935683 0.78 KMT2A (0.51) MEN1KMT2AESR1GAAESR2
SCHEMBL8499995 0.78 MEN1 (0.38) MEN1KMT2AESR1GAAESR2
SCHEMBL7475140 0.78 MEN1 (0.38) MEN1KMT2AESR1GAAESR2
SCHEMBL3844084 0.76 MEN1 (0.41) MEN1KMT2AESR1GAAESR2
SCHEMBL10701705 0.74 MEN1 (0.50) MEN1KMT2AAGERLMNAALDH1A1
SCHEMBL8378270 0.72 MEN1 (0.50) MEN1KMT2AESR1GAAESR2
SCHEMBL7521769 0.72 ALPL (0.39) KMT2AGAALMNAALDH1A1MAPT
SCHEMBL3839443 0.72 MEN1 (0.43) MEN1KMT2AESR1GAAESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed
EP-0956312-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR Corporation (JP) 1999-11-17 EP disclosed
WO-1998033836-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORPORATION (JP) 1998-08-06 WO disclosed