SCHEMBL74839

SCHEMBL74839

Brc1ccccc1Oc1ccc(Oc2ccccc2Br)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
L3MBTL1 Q9Y468 2/20 0.52
MAPK1 P28482 1/20 0.52
HTT P42858 1/20 0.52
SLC6A2 P23975 2/20 0.44
SLC6A4 P31645 2/20 0.44
SLC6A3 Q01959 2/20 0.44
LTA4H P09960 1/20 0.41
TSHR P16473 1/20 0.41
NCOA1 Q15788 1/20 0.41
NCOA3 Q9Y6Q9 1/20 0.41
HTR7 P34969 1/20 0.41
LMNA P02545 4/20 0.40
GAA P10253 3/20 0.40
KMT2A Q03164 1/20 0.40
POLB P06746 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
NR3C1 P04150 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3843172 0.97 ALDH1A1 (0.50) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL8954758 0.93 LTA4H (0.55) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL3845666 0.93 SLC6A4 (0.53) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL130304 0.92 LTA4H (0.52) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL3898531 0.91 ALDH1A1 (0.49) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL30039490 0.91 ALDH1A1 (0.49) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL4859489 0.90 LTA4H (0.50) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL4702941 0.89 ALDH1A1 (0.59) ALDH1A1L3MBTL1MAPK1HTTSLC6A2
SCHEMBL325532 0.89 LTA4H (0.56) ALDH1A1L3MBTL1MAPK1HTTLTA4H
SCHEMBL5567756 0.89 NCOA1 (0.47) ALDH1A1L3MBTL1MAPK1HTTSLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8129081-B2 Photoconductive imaging members XEROX CORPORATION (US) 2012-03-06 US claimed
US-20100068639-A1 PHOTOCONDUCTIVE IMAGING MEMBERS XEROX CORPORATION (US) 2010-03-18 US claimed
US-6884862-B2 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2005-04-26 US claimed
US-8258503-B2 Charge generation layer doped with dihalogen ether XEROX CORPORATION (US) 2012-09-04 US disclosed
US-8129081-B2 Photoconductive imaging members XEROX CORPORATION (US) 2012-03-06 US disclosed
US-20100230661-A1 CHARGE GENERATION LAYER DOPED WITH DIHALOGEN ETHER XEROX CORPORATION (US) 2010-09-16 US disclosed
US-20100068639-A1 PHOTOCONDUCTIVE IMAGING MEMBERS XEROX CORPORATION (US) 2010-03-18 US disclosed
US-7556860-B2 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2009-07-07 US disclosed
EP-1245638-B1 Composition for insulating film formation JSR CORP (JP) 2009-01-14 EP disclosed
EP-1298176-B1 Stacked film insulating film and substrate for semiconductor JSR CORP (JP) 2007-01-03 EP disclosed
US-20060216531-A1 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2006-09-28 US disclosed
US-6824833-B2 STACKED DIELECTRIC JSR CORPORATION (JP) 2004-11-30 US disclosed
EP-1254917-B1 Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film JSR CORP (JP) 2004-06-30 EP disclosed
US-20030077461-A1 Stacked film, insulating film and substrate for semiconductor JSR CORPORATION (JP) 2003-04-24 US disclosed
EP-1298176-A2 Stacked film insulating film and substrate for semiconductor JSR Corporation (JP) 2003-04-02 EP disclosed
US-20020172652-A1 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2002-11-21 US disclosed
EP-1254917-A1 Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film JSR Corporation (JP) 2002-11-06 EP disclosed
US-20020161173-A1 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2002-10-31 US disclosed
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed
WO-1984004968-A1 PROCESS OF DETERMINATION OF THE CONCENTRATION OF HALOGEN IN ORGANIC SAMPLES TNO (NL) 1984-12-20 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172652-A1 Composition for film formation and material for insulating film formation VCL, BMI1, PUF60 ALDH1A1 2731/4885L3MBTL1 2698/4885MAPK1 2221/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.