Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR | P02766 | 2/20 | 0.46 |
| ▸ | FABP4 | P15090 | 1/20 | 0.46 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.46 |
| ▸ | CDK2 | P24941 | 1/20 | 0.46 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.46 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 7/20 | 0.41 |
| ▸ | CA1 | P00915 | 6/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA6 | P23280 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA5A | P35218 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.41 |
| ▸ | MYC | P01106 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CHAT | P28329 | 1/20 | 0.39 |
| ▸ | SNCA | P37840 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31504549 | 1.00 | TTR (0.46) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL8779847 | 0.80 | TTR (0.47) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL27615953 | 0.79 | CA1 (0.46) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL998621 | 0.78 | CA2 (0.67) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL5403732 | 0.78 | TTR (0.46) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL31504547 | 0.78 | TTR (0.46) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL14511497 | 0.78 | TTR (0.46) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL3379116 | 0.78 | TTR (0.46) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL7513876 | 0.78 | TTR (0.46) | TTRFABP4CCNA2CDK2MAPK14 | |
| SCHEMBL35949 | 0.78 | HTR6 (0.60) | TTRFABP4CCNA2CDK2MAPK14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109535047-A | A kind of preparation method of Lapatinib side chain 2- (methyl sulphonyl) ethylamine salt | 成都美睿科生物科技有限公司 | 2019-03-29 | — | — | CN | claimed |
| CN-106478473-A | Preparation method of lapatinib side chain 2- (methylsulfonyl) ethylamine salt | 成都美睿科生物科技有限公司 | 2017-03-08 | — | — | CN | claimed |
| WO-2024257864-A1 | WATER SOLUBLE COMPOSITION, METHOD FOR PRODUCING SAME, CONDUCTIVE COMPOSITION, AND METHOD FOR PRODUCING SAME | 三菱ケミカル株式会社 | 2024-12-19 | — | — | WO | disclosed |
| US-20240371542-A1 | CONDUCTOR, CONDUCTIVE COMPOSITION AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-11-07 | — | — | US | disclosed |
| CN-118620412-A | Conductive composition, resist coating material, resist, and method for forming resist pattern | 三菱化学株式会社 | 2024-09-10 | — | — | CN | disclosed |
| US-12073956-B2 | Conductor, conductive composition and laminate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-08-27 | — | — | US | disclosed |
| CN-114945635-B | Conductive composition, resist coating material, resist, and method for forming resist pattern | 三菱化学株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-112996856-B | Conductive composition and method for producing same, and conductive body and method for producing same | 三菱化学株式会社 | 2024-04-09 | — | — | CN | disclosed |
| US-20230168584-A1 | CONDUCTIVE POLYMER COMPOSITION, COATED PRODUCT, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| CN-116178948-A | Conductive polymer composition, cover and pattern forming method | 信越化学工业株式会社 | 2023-05-30 | — | — | CN | disclosed |
| EP-4098702-A1 | CONDUCTIVE COMPOSITE, RESIST COATING MATERIAL, RESIST, AND RESIST PATTERN FORMATION METHOD | Mitsubishi Chemical Corporation (JP) | 2022-12-07 | — | — | EP | disclosed |
| US-20130012655-A1 | CONDUCTIVE POLYMER, QUALITY CONTROL METHOD FOR CONDUCTIVE POLYMER AND METHOD FOR PURIFYING CONDUCTIVE POLYMER TECHNICAL FIELD | MITSUBISHI RAYON CO., LTD. (JP) | 2013-01-10 | — | — | US | disclosed |
| EP-0662694-B1 | Soluble aniline conducting polymers | MITSUBISHI RAYON CO (JP) | 2002-02-27 | — | — | EP | disclosed |
| EP-0834885-B1 | Method for producing soluble conductive polymers having acidic groups | MITSUBISHI RAYON CO (JP) | 2002-01-02 | — | — | EP | disclosed |
| US-5980784-A | SUBJECTING TO ELECTROLYTIC POLYMERIZATION AT LEAST ONE COMPOUND SELECTED FROM THE GROUP CONSISTING OF ACIDIC GROUP SUBSTITUTED ANILINES, PYRROLES, THIOPHENES, FURANS, SELENOPHENES, TELLUROPHENES, ISOTHIANAPHTHENES, IN BASE | MITSUBISHI RAYON CO., LTD. (JP) | 1999-11-09 | — | — | US | disclosed |
| US-5932144-A | ALKOXY GROUP SUBSTITUTED AMINOBENZENESULFONIC ACID, OR SALT THEREOF | MITSUBISHI RAYON CO., LTD. (JP) | 1999-08-03 | — | — | US | disclosed |
| EP-0834885-A2 | Method for producing soluble conductive polymer having acidic groups | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1998-04-08 | — | — | EP | disclosed |
| US-5700399-A | Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| US-5589108-A | Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| EP-0662694-A2 | Soluble aniline conducting polymers | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1995-07-12 | — | — | EP | disclosed |