SCHEMBL7513876

SCHEMBL7513876

O=S(=O)(O)c1ccccc1NF

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 2/20 0.46
FABP4 P15090 1/20 0.46
CCNA2 P20248 1/20 0.46
CDK2 P24941 1/20 0.46
MAPK14 Q16539 1/20 0.46
NR4A1 P22736 1/20 0.45
CA2 P00918 8/20 0.41
CA1 P00915 7/20 0.41
CA9 Q16790 3/20 0.41
CA12 O43570 1/20 0.41
CA6 P23280 1/20 0.41
CA5A P35218 1/20 0.41
CA7 P43166 1/20 0.41
CA5B Q9Y2D0 1/20 0.41
MYC P01106 1/20 0.40
TSHR P16473 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CHAT P28329 1/20 0.39
SNCA P37840 1/20 0.39
ALDH1A1 P00352 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31504547 1.00 TTR (0.46) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL8779847 0.80 TTR (0.47) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL7514455 0.78 TTR (0.46) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL998621 0.78 CA2 (0.67) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL31504549 0.78 TTR (0.46) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL14511497 0.78 TTR (0.46) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL35949 0.78 HTR6 (0.60) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL3379116 0.78 TTR (0.46) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL5403732 0.78 TTR (0.46) TTRFABP4CCNA2CDK2MAPK14
SCHEMBL27344069 0.78 ADRA1A (0.45) CA2CA1CA9CA12CA6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4729582-A1 WATER SOLUBLE COMPOSITION, METHOD FOR PRODUCING SAME, CONDUCTIVE COMPOSITION, AND METHOD FOR PRODUCING SAME Mitsubishi Chemical Corporation (JP) 2026-04-22 EP disclosed
US-20260098127-A1 WATER SOLUBLE COMPOSITION, METHOD FOR PRODUCING SAME, CONDUCTIVE COMPOSITION, AND METHOD FOR PRODUCING SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2026-04-09 US disclosed
US-12443103-B2 Conductive composition and method for manufacturing same, and conductor and method for manufacturing same MITSUBISHI CHEMICAL CORPORATION (JP) 2025-10-14 US disclosed
EP-4588657-A1 MANUFACTURING METHOD FOR CONDUCTIVE FILM, MANUFACTURING METHOD FOR MASK, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, DEFECT EXAMINATION METHOD FOR CONDUCTIVE FILM, AND DEFECT EXAMINATION DEVICE Mitsubishi Chemical Corporation (JP) 2025-07-23 EP disclosed
US-20250208500-A1 MANUFACTURING METHOD FOR CONDUCTIVE FILM, MANUFACTURING METHOD FOR MASK, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, DEFECT EXAMINATION METHOD FOR CONDUCTIVE FILM, AND DEFECT EXAMINATION DEVICE MITSUBISHI CHEMICAL CORPORATION (JP) 2025-06-26 US disclosed
WO-2024257864-A1 WATER SOLUBLE COMPOSITION, METHOD FOR PRODUCING SAME, CONDUCTIVE COMPOSITION, AND METHOD FOR PRODUCING SAME 三菱ケミカル株式会社 2024-12-19 WO disclosed
US-20240371542-A1 CONDUCTOR, CONDUCTIVE COMPOSITION AND LAMINATE MITSUBISHI CHEMICAL CORPORATION (JP) 2024-11-07 US disclosed
EP-3709081-B1 CONDUCTIVE POLYMER COMPOSITION, COATED PRODUCT AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2024-09-18 EP disclosed
CN-118620412-A Conductive composition, resist coating material, resist, and method for forming resist pattern 三菱化学株式会社 2024-09-10 CN disclosed
US-12073956-B2 Conductor, conductive composition and laminate MITSUBISHI CHEMICAL CORPORATION (JP) 2024-08-27 US disclosed
EP-2551290-A1 CONDUCTIVE POLYMER, QUALITY CONTROL METHOD FOR CONDUCTIVE POLYMER AND METHOD FOR PURIFYING CONDUCTIVE POLYMER Mitsubishi Rayon Co., Ltd. (JP) 2013-01-30 EP disclosed
US-20130012655-A1 CONDUCTIVE POLYMER, QUALITY CONTROL METHOD FOR CONDUCTIVE POLYMER AND METHOD FOR PURIFYING CONDUCTIVE POLYMER TECHNICAL FIELD MITSUBISHI RAYON CO., LTD. (JP) 2013-01-10 US disclosed
EP-0662694-B1 Soluble aniline conducting polymers MITSUBISHI RAYON CO (JP) 2002-02-27 EP disclosed
EP-0834885-B1 Method for producing soluble conductive polymers having acidic groups MITSUBISHI RAYON CO (JP) 2002-01-02 EP disclosed
US-5980784-A SUBJECTING TO ELECTROLYTIC POLYMERIZATION AT LEAST ONE COMPOUND SELECTED FROM THE GROUP CONSISTING OF ACIDIC GROUP SUBSTITUTED ANILINES, PYRROLES, THIOPHENES, FURANS, SELENOPHENES, TELLUROPHENES, ISOTHIANAPHTHENES, IN BASE MITSUBISHI RAYON CO., LTD. (JP) 1999-11-09 US disclosed
US-5932144-A ALKOXY GROUP SUBSTITUTED AMINOBENZENESULFONIC ACID, OR SALT THEREOF MITSUBISHI RAYON CO., LTD. (JP) 1999-08-03 US disclosed
EP-0834885-A2 Method for producing soluble conductive polymer having acidic groups NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1998-04-08 EP disclosed
US-5700399-A Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1997-12-23 US disclosed
US-5589108-A Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1996-12-31 US disclosed
EP-0662694-A2 Soluble aniline conducting polymers NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1995-07-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260098127-A1 WATER SOLUBLE COMPOSITION, METHOD FOR PRODUCING SAME, CONDUCTIVE COMPOSITION, AND METHOD FOR PRODUCING SAME GJA1, GUCY1A2, GJB2 TTR 1255/4885FABP4 3208/4885CCNA2 1826/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.