Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 6/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10339546 | 0.90 | ALDH1A1 (0.43) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL12789621 | 0.84 | TSHR (0.42) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL9615565 | 0.83 | ALDH1A1 (0.45) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL8923052 | 0.83 | ALDH1A1 (0.46) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL489144 | 0.82 | ALDH1A1 (0.45) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL35054 | 0.81 | THRB (0.45) | ALDH1A1TDP1THRBTSHRL3MBTL1 | |
| SCHEMBL7178158 | 0.81 | ALDH1A1 (0.44) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL15910796 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL36715 | 0.80 | TSHR (0.56) | ALDH1A1TDP1POLBAPEX1HTT | |
| SCHEMBL4783599 | 0.80 | TSHR (0.56) | ALDH1A1TDP1POLBAPEX1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5707543-A | LIGHT SCATTERING AND RADIATION TRANSPARENT MEDIUM ON SUBSTRATES FOR OPTICAL RECORDING MEDIA USING LIQUID CRYSTALS | FUJI XEROX CO., LTD. (JP) | 1998-01-13 | — | — | US | claimed |
| US-20250155808-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2025-05-15 | — | — | US | disclosed |
| US-10023712-B2 | Heat-expandable microspheres, process for producing the same and application thereof | MATSUMOTO YUSHI-SEIYAKU CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| EP-2431150-B1 | TRANSFER SHEET AND PROCESS FOR PRODUCING SAME | DAIKIN IND LTD (JP) | 2017-08-23 | — | — | EP | disclosed |
| US-20170218151-A1 | TRANSFER SHEET AND PROCESS FOR PRODUCING SAME | DAIKIN INDUSTRIES, LTD. (JP) | 2017-08-03 | — | — | US | disclosed |
| US-20170190157-A1 | RESIN PRODUCT | MITSUBISHI RAYON CO., LTD. (JP) | 2017-07-06 | — | — | US | disclosed |
| EP-3150657-A1 | RESIN PRODUCT | Mitsubishi Rayon Co., Ltd. (JP) | 2017-04-05 | — | — | EP | disclosed |
| US-20170081492-A1 | HEAT-EXPANDABLE MICROSPHERES, PROCESS FOR PRODUCING THE SAME AND APPLICATION THEREOF | MATSUMOTO YUSHI-SEIYAKU CO., LTD. (JP) | 2017-03-23 | — | — | US | disclosed |
| US-8796397-B2 | Silicone resin, process for producing the same, and curable resin composition comprising the same | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8754181-B2 | Silicone resin, process for producing the same, and curable resin composition comprising the same | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20040181008-A1 | Surface-treating agent composition and process for producing the same | DAIKIN INDUSTRIES, LTD. (JP) | 2004-09-16 | — | — | US | disclosed |
| EP-1411073-A1 | SURFACE-TREATING AGENT COMPOSITION AND PROCESS FOR PRODUCING THE SAME | Daikin Industries, Ltd. (JP) | 2004-04-21 | — | — | EP | disclosed |
| EP-0669548-B1 | Optical element and process for producing the same | FUJI XEROX CO LTD (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-5670083-A | CROSSLINKED LIQUID CRYSTAL POLYMER | FUJI XEROX CO., LTD. (JP) | 1997-09-23 | — | — | US | disclosed |
| EP-0669548-A1 | Optical element and process for producing the same | FUJI XEROX CO., LTD. (JP) | 1995-08-30 | — | — | EP | disclosed |
| US-5384380-A | Polymerizable compositions and high refractive plastic lens obtained therefrom | DAISO CO., LTD. (JP) | 1995-01-24 | — | — | US | disclosed |
| EP-0606905-A2 | Polymerizable compositions and high refractive plastic lens obtained therefrom | DAISO CO., LTD. (JP) | 1994-07-20 | — | — | EP | disclosed |
| EP-0348063-B1 | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1993-05-26 | — | — | EP | disclosed |
| US-5177171-A | SULFONIC ACID GROUP-CONTAINING POLYURETHANE AND A PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1993-01-05 | — | — | US | disclosed |
| US-5053316-A | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1991-10-01 | — | — | US | disclosed |