⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6206429 | 0.69 | — | — | |
| SCHEMBL7175614 | 0.63 | — | — | |
| SCHEMBL856949 | 0.63 | MAOA (0.38) | — | |
| SCHEMBL5706548 | 0.59 | MAPT (0.35) | — | |
| SCHEMBL8018963 | 0.59 | MAOA (0.46) | — | |
| SCHEMBL6910592 | 0.58 | — | — | |
| SCHEMBL23704523 | 0.58 | MAOA (0.44) | — | |
| SCHEMBL891550 | 0.56 | MAOA (0.68) | — | |
| SCHEMBL6294074 | 0.55 | CA2 (0.37) | — | |
| SCHEMBL4290445 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3512905-A1 | METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) | BASF SE (DE) | 2019-07-24 | — | — | EP | claimed |
| WO-2018050489-A1 | METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) | BASF SE (DE) | 2018-03-22 | — | — | WO | claimed |
| EP-3762447-A1 | METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) | BASF SE (DE) | 2021-01-13 | — | — | EP | disclosed |
| WO-2019170529-A1 | METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) | BASF SE (DE) | 2019-09-12 | — | — | WO | disclosed |
| EP-3512905-A1 | METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) | BASF SE (DE) | 2019-07-24 | — | — | EP | disclosed |
| WO-2018050489-A1 | METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) | BASF SE (DE) | 2018-03-22 | — | — | WO | disclosed |
| EP-1043627-B1 | Recording material having a pigment-colored radiation-sensitive layer | AGFA GEVAERT (BE) | 2002-06-12 | — | — | EP | disclosed |
| EP-0838478-B1 | Amido substituted acetal polymers and their use in photosensitive compositions and lithographic printing plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2002-02-27 | — | — | EP | disclosed |
| EP-1043627-A1 | Recording material having a pigment-colored radiation-sensitive layer | Agfa-Gevaert AG (DE) | 2000-10-11 | — | — | EP | disclosed |
| EP-0838478-A1 | Amido substituted acetal polymers and their use in photosensitive compositions and lithographic printing plates | SUN CHEMICAL CORPORATION (US) | 1998-04-29 | — | — | EP | disclosed |
| EP-0420002-B1 | Electrophotographic recording material | HOECHST AG (DE) | 1995-12-13 | — | — | EP | disclosed |
| EP-0381043-B1 | Light-sensitive mixture and registration material prepared therefrom | HOECHST AG (DE) | 1994-11-09 | — | — | EP | disclosed |
| EP-0272550-B1 | LIGHT-SENSITIVE REGISTRATION MATERIAL WITH A LIGHT-SENSITIVE INTERMEDIATE LAYER | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-08-12 | — | — | EP | disclosed |
| EP-0381043-A2 | Light-sensitive mixture and registration material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-08-08 | — | — | EP | disclosed |
| EP-0211391-B1 | LIGHT-SENSITIVE MIXTURE AND REGISTRATION MATERIAL PREPARED THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-12-20 | — | — | EP | disclosed |
| EP-0272550-A2 | Light-sensitive registration material with a light-sensitive intermediate layer | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-06-29 | — | — | EP | disclosed |
| EP-0211391-A2 | Light-sensitive mixture and registration material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-02-25 | — | — | EP | disclosed |
| EP-0152819-A1 | Light-sensitive mixture with diazoresins and light-sensitive registration material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-08-28 | — | — | EP | disclosed |