SCHEMBL7522981

SCHEMBL7522981

Cc1cc(-c2cc(C)c(-c3cc(C)c(O)c(C)c3C)c(O)c2O)c(C)c(C)c1O

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
KDM4E B2RXH2 3/20 0.32
MAPT P10636 3/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
USP2 O75604 1/20 0.32
ALDH1A1 P00352 2/20 0.31
HPGD P15428 1/20 0.31
RECQL P46063 1/20 0.31
LMNA P02545 1/20 0.30
GAA P10253 1/20 0.30
SENP1 Q9P0U3 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29429119 0.84 CA1 (0.48) CA1CA2KDM4EMAPTMEN1
SCHEMBL1176388 0.84 CA1 (0.48) CA1CA2KDM4EMAPTMEN1
SCHEMBL10596945 0.78 KDM4E (0.39) CA1CA2KDM4EMAPTMEN1
SCHEMBL8828331 0.76 ELANE (0.41) CA1CA2KDM4EMAPTMEN1
SCHEMBL1176908 0.75 ALDH1A1 (0.41) CA1CA2KDM4EMAPTMEN1
SCHEMBL1224695 0.74 CA1 (0.48) CA1CA2KDM4EMAPTMEN1
SCHEMBL18948599 0.74 LMNA (0.43) CA1CA2KDM4EMAPTMEN1
SCHEMBL16424027 0.72 ALDH1A1 (0.61) CA1CA2KDM4EMAPTMEN1
SCHEMBL3752346 0.71 CA1 (0.59) CA1CA2KDM4EMAPTMEN1
SCHEMBL17060497 0.71 CA1 (0.46) CA1CA2KDM4EMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0848289-B1 Negative-working chemical sensitization photoresist composition TOKYO OHKA KOGYO CO LTD (JP) 2002-02-27 EP disclosed
US-5928837-A Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds TOKYO OHKA KOGYO CO., LTD. (JP) 1999-07-27 US disclosed
EP-0848289-A1 Negative-working chemical sensitization photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-06-17 EP disclosed
US-5677102-A DISSOLVING AN ALKALI SOLUBLE RESIN AND A QUINONEDIAZIDE GROUP CONTAINING COMPOUND; HEATING TOKYO OHKA KOGYO CO., LTD. (JP) 1997-10-14 US disclosed