Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 5/20 | 0.41 |
| ▸ | CTSG | P08311 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 4/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 3/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | TDP2 | O95551 | 1/20 | 0.32 |
| ▸ | NSD2 | O96028 | 1/20 | 0.32 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1176388 | 0.81 | CA1 (0.48) | MAPTKDM4EMEN1KMT2AUSP2 | |
| SCHEMBL29429119 | 0.81 | CA1 (0.48) | MAPTKDM4EMEN1KMT2AUSP2 | |
| SCHEMBL1176908 | 0.79 | ALDH1A1 (0.41) | ELANECTSGMAPTKDM4EMEN1 | |
| SCHEMBL16424027 | 0.78 | ALDH1A1 (0.61) | MAPTKDM4EMEN1KMT2AALDH1A1 | |
| SCHEMBL8427886 | 0.77 | ELANE (0.57) | ELANECTSGMAPTKDM4EMEN1 | |
| SCHEMBL13894735 | 0.76 | ELANE (0.54) | ELANECTSGMAPTKDM4EMEN1 | |
| SCHEMBL7522981 | 0.76 | CA1 (0.36) | MAPTKDM4EMEN1KMT2AUSP2 | |
| Phenol SCHEMBL4666810 | 0.76 | TDP1 (0.46) | MAPTMEN1KMT2AALDH1A1CA1 | |
| SCHEMBL18948599 | 0.75 | LMNA (0.43) | ELANEMAPTKDM4EMEN1KMT2A | |
| SCHEMBL9135770 | 0.75 | ELANE (0.35) | ELANECTSG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| US-10067422-B2 | Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and method for forming interlayer insulating film | TOKYO OHKA KOGYO CO. LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| US-9851638-B2 | Photosensitive polysiloxane composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-12-26 | — | — | US | disclosed |
| US-20170255099-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, AND METHOD FOR FORMING INTERLAYER INSULATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| US-20170168390-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | CHI MEI CORPORATION (TW) | 2017-06-15 | — | — | US | disclosed |
| US-20170023860-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORP (TW) | 2017-01-26 | — | — | US | disclosed |
| US-9389509-B2 | Photosensitive polysiloxane composition, protecting film and element having the protecting film | CHI MEI CORPORATION (TW) | 2016-07-12 | — | — | US | disclosed |
| US-20150346601-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE PROTECTIVE FILM | CHI MEI CORPORATION (TW) | 2015-12-03 | — | — | US | disclosed |
| US-20150293449-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-10-15 | — | — | US | disclosed |
| US-20150234275-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM AND ELEMENT HAVING THE PROTECTING FILM | CHI MEI CORPORATION (TW) | 2015-08-20 | — | — | US | disclosed |
| US-20150050596-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-02-19 | — | — | US | disclosed |
| US-20150031808-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-01-29 | — | — | US | disclosed |
| US-20140322651-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM AND ELEMENT HAVING THE PROTECTING FILM | CHI MEI CORPORATION (TW) | 2014-10-30 | — | — | US | disclosed |
| US-5677102-A | DISSOLVING AN ALKALI SOLUBLE RESIN AND A QUINONEDIAZIDE GROUP CONTAINING COMPOUND; HEATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-10-14 | — | — | US | disclosed |