SCHEMBL7524992

SCHEMBL7524992

CCOC(=O)Cc1c([N+](=O)[O-])cccc1[N+](=O)[O-]

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.47
TDP1 Q9NUW8 2/20 0.47
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
HTT P42858 1/20 0.46
RAB9A P51151 1/20 0.46
L3MBTL1 Q9Y468 2/20 0.45
TSHR P16473 2/20 0.45
SMN1; SMN2 Q16637 4/20 0.45
ALDH1A1 P00352 3/20 0.45
LMNA P02545 2/20 0.45
GAA P10253 1/20 0.45
MAPT P10636 3/20 0.44
CACNA1C Q13936 1/20 0.43
KDM4E B2RXH2 2/20 0.43
GPR35 Q9HC97 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL945131 0.89 ALDH1A1 (0.50) MAPK1TDP1RAB9AL3MBTL1TSHR
SCHEMBL1716245 0.86 CES2 (0.46) TDP1MEN1KMT2ARAB9AL3MBTL1
SCHEMBL7913797 0.83 PDGFRB (0.48) MAPK1TDP1MEN1KMT2ARAB9A
SCHEMBL3727437 0.83 TDP1 (0.51) MAPK1TDP1MEN1KMT2AHTT
SCHEMBL18190810 0.83 ALDH1A1 (0.44) MAPK1MEN1KMT2AHTTL3MBTL1
SCHEMBL3796044 0.83 MAPK1 (0.61) MAPK1MEN1KMT2ARAB9AL3MBTL1
SCHEMBL31031180 0.83 MAPK1 (0.61) MAPK1MEN1KMT2ARAB9AL3MBTL1
SCHEMBL11372289 0.82 RAB9A (0.52) MAPK1MEN1KMT2AHTTRAB9A
SCHEMBL12053309 0.82 GPR35 (0.50) MAPK1MEN1KMT2AHTTRAB9A
SCHEMBL7816604 0.81 GPR35 (0.43) MAPK1TDP1MEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1035437-B1 A radiation-sensitive resist material and a process for device fabrication using the same LUCENT TECHNOLOGIES INC (US) 2002-03-27 EP disclosed
US-6296984-B1 PHOTORESISTS LIGHT SENSITIVE LAYERS ON A SUBSTRATE WITH CHROMOPHORE OF IODINIUM AND SULFONIUM GROUPS AGERE SYSTEMS GUARDIAN CORP. 2001-10-02 US disclosed
EP-1035437-A2 A radiation-sensitive resist material and a process for device fabrication using the same LUCENT TECHNOLOGIES INC. (US) 2000-09-13 EP disclosed