SCHEMBL7526394

SCHEMBL7526394

CCCc1ccc(-c2ccc(C(=O)OC(=O)O[C@H](C)CC(CC)CC)cc2)c(-c2ccccc2)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDCD1 Q15116 1/20 0.38
CD274 Q9NZQ7 1/20 0.38
PTPN1 P18031 3/20 0.37
EGFR P00533 1/20 0.37
PTGS2 P35354 1/20 0.36
CYP4F2 P78329 1/20 0.34
CYP4A11 Q02928 1/20 0.34
RARB P10826 2/20 0.34
SCN1A P35498 1/20 0.34
SCN2A Q99250 1/20 0.34
SCN3A Q9NY46 1/20 0.34
TAS1R3 Q7RTX0 1/20 0.34
TAS1R1 Q7RTX1 1/20 0.34
HCRTR1 O43613 1/20 0.34
HCRTR2 O43614 1/20 0.34
PTAFR P25105 1/20 0.34
MAPT P10636 4/20 0.33
THRB P10828 1/20 0.33
NPC1 O15118 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7526386 0.94 PTGS2 (0.40) PDCD1CD274PTPN1EGFRPTGS2
SCHEMBL7517699 0.88 PDCD1 (0.46) PDCD1CD274PTPN1EGFRPTGS2
SCHEMBL7517692 0.87 PTGS2 (0.44) PDCD1CD274EGFRPTGS2SCN1A
SCHEMBL7517697 0.87 PTGS2 (0.44) PDCD1CD274EGFRPTGS2SCN1A
SCHEMBL6564029 0.85 NPC1 (0.41) CYP4F2CYP4A11RARBHCRTR1HCRTR2
SCHEMBL7520431 0.79 SCN1A (0.34) PTPN1RARBSCN1ASCN2ASCN3A
SCHEMBL6563502 0.79 PDCD1 (0.48) PDCD1CD274EGFRPTGS2SCN1A
SCHEMBL6563509 0.79 PDCD1 (0.48) PDCD1CD274EGFRPTGS2SCN1A
SCHEMBL6562354 0.77 RARB (0.41) RARBHCRTR1HCRTR2MAPTNPC1
SCHEMBL6562073 0.77 CYP4F2 (0.48) PDCD1CD274CYP4F2CYP4A11RARB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020146517-A1 Optically active compound and liquid crystal composition containing the compound MITSUBISHI GAS CHEMICAL COMPANY, INC. 2002-10-10 US disclosed