Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 7/20 | 0.41 |
| ▸ | CTSL | P07711 | 5/20 | 0.41 |
| ▸ | CTSB | P07858 | 4/20 | 0.41 |
| ▸ | CTSS | P25774 | 1/20 | 0.39 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.34 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.34 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.34 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | PPARG | P37231 | 3/20 | 0.32 |
| ▸ | PPARA | Q07869 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7521250 | 0.90 | APOBEC3A (0.36) | CTSKCTSLCTSBCTSSAPOBEC3A | |
| SCHEMBL7252956 | 0.90 | CTSK (0.37) | CTSKCTSLCTSBCTSS | |
| SCHEMBL15188009 | 0.86 | CTSK (0.48) | CTSKCTSLCTSBCTSSELANE | |
| SCHEMBL7251880 | 0.80 | KDM4E (0.30) | APOBEC3AAPOBEC3G | |
| SCHEMBL21370 | 0.79 | MTNR1A (0.45) | MTNR1AMTNR1BELANEMEN1KMT2A | |
| SCHEMBL7523921 | 0.77 | CTSK (0.35) | CTSKCTSLCTSBCTSSAPOBEC3A | |
| Methacrylic Acid SCHEMBL25394729 | 0.77 | MTNR1A (0.43) | MTNR1AMTNR1BELANEMEN1KMT2A | |
| SCHEMBL18106793 | 0.77 | ALDH1A1 (0.46) | MTNR1AMTNR1BELANEKMT2APPARG | |
| SCHEMBL7251835 | 0.75 | CTSK (0.42) | CTSKCTSLCTSBCTSSELANE | |
| SCHEMBL7184057 | 0.74 | MTNR1A (0.41) | MTNR1AMTNR1BELANEMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020039701-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-04 | — | — | US | disclosed |