SCHEMBL7538145

SCHEMBL7538145

CC(C)COC(=O)OC=Cc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
TSHR P16473 1/20 0.47
LMNA P02545 3/20 0.40
NPC1 O15118 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
RAB9A P51151 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
TDP1 Q9NUW8 2/20 0.40
HPGD P15428 1/20 0.40
GLA P06280 1/20 0.40
CACNA1F O60840 1/20 0.39
CACNA1D Q01668 1/20 0.39
CACNA1S Q13698 1/20 0.39
CACNA1C Q13936 1/20 0.39
P2RX4 Q99571 1/20 0.39
PAM P19021 1/20 0.39
CTDSP1 Q9GZU7 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
HDAC3 O15379 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2907535 0.84 ALDH1A1 (0.50) ALDH1A1TSHRLMNASMN1; SMN2RAB9A
SCHEMBL9117765 0.84 ALDH1A1 (0.47) ALDH1A1TSHRLMNARAB9AL3MBTL1
SCHEMBL7541866 0.82 MEN1 (0.53) ALDH1A1LMNANPC1SMN1; SMN2RAB9A
SCHEMBL7542602 0.80 ALDH1A1 (0.49) ALDH1A1LMNASMN1; SMN2TDP1GLA
SCHEMBL7534897 0.79 LMNA (0.49) ALDH1A1LMNANPC1SMN1; SMN2RAB9A
SCHEMBL377478 0.79 HDAC1 (0.52) ALDH1A1LMNANPC1SMN1; SMN2RAB9A
SCHEMBL6510327 0.79 HTR2A (0.43) ALDH1A1LMNASMN1; SMN2TDP1GLA
SCHEMBL7537129 0.79 CYP1A2 (0.45) ALDH1A1TSHRLMNANPC1SMN1; SMN2
SCHEMBL14504434 0.78 TDP1 (0.46) ALDH1A1LMNANPC1SMN1; SMN2RAB9A
SCHEMBL27665248 0.78 TDP1 (0.46) ALDH1A1LMNANPC1SMN1; SMN2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed