Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | CES2 | O00748 | 4/20 | 0.42 |
| ▸ | CES1 | P23141 | 4/20 | 0.42 |
| ▸ | CNR2 | P34972 | 1/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.40 |
| ▸ | CTSG | P08311 | 1/20 | 0.40 |
| ▸ | CTRB1 | P17538 | 1/20 | 0.40 |
| ▸ | CMA1 | P23946 | 1/20 | 0.40 |
| ▸ | NAAA | Q02083 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1899408 | 0.82 | POLB (0.49) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL7086708 | 0.80 | PTGS2 (0.41) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL11765158 | 0.78 | PRSS1 (0.39) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL11528495 | 0.78 | CES2 (0.47) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL504212 | 0.76 | MDM2 (0.53) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL5275919 | 0.76 | MMP2 (0.49) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL1030508 | 0.76 | MMP2 (0.49) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL3677232 | 0.76 | MMP2 (0.49) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL207033 | 0.76 | PTGS2 (0.38) | POLBCES2CES1CNR2PRSS1 | |
| SCHEMBL5340196 | 0.76 | MMP2 (0.49) | POLBCES2CES1CNR2PRSS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0860740-B1 | Pattern forming material | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2002-05-29 | — | — | EP | disclosed |
| US-6261736-B1 | COMPRISING POLYMER WHICH GENERATES ACID WHEN HEATED AND COMPOUND WHICH GENERATES A BASE WHEN IRRADIATED; SEMICONDUCTOR INTEGRATED CIRCUITS; PHOTORESIST FILMS | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-07-17 | — | — | US | disclosed |
| EP-1028353-A1 | Pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2000-08-16 | — | — | EP | disclosed |
| US-6017683-A | COATING SEMICONDUCTOR SUBSTRATE WITH PATTERN FORMING MATERIAL INCLUDING POLYMER; HEATING TO GENERATE ACID FROM POLYMER; IRRADIATING RESIST FILM TO GENERATE BASE; SUPPLYING METAL ALKOXIDE ONTO FILM AND FORMING METAL OXIDE FILM; DRY ETCHING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2000-01-25 | — | — | US | disclosed |
| EP-0860740-A1 | Pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-08-26 | — | — | EP | disclosed |