SCHEMBL754110

SCHEMBL754110

CCOc1ccc2cc3ccccc3cc2c1OCC

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.44
NQO1 P15559 1/20 0.44
S1PR1 P21453 1/20 0.42
TLR8 Q9NR97 1/20 0.41
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
ALDH1A1 P00352 5/20 0.40
KDM4E B2RXH2 3/20 0.40
IDO1 P14902 1/20 0.39
MAPT P10636 1/20 0.38
GAA P10253 1/20 0.38
MAPK1 P28482 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
SLC2A1 P11166 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthracene SCHEMBL10715579 1.00 ALOX5 (0.44) ALOX5NQO1S1PR1TLR8NPC1
SCHEMBL27740250 0.90 NQO1 (0.55) ALOX5NQO1NPC1RAB9AALDH1A1
SCHEMBL27803631 0.89 TDP1 (0.46) ALOX5NQO1S1PR1TLR8ALDH1A1
SCHEMBL27800237 0.89 TDP1 (0.49) NQO1TLR8ALDH1A1KDM4EMAPT
SCHEMBL27803632 0.86 ALOX5 (0.40) ALOX5NQO1S1PR1TLR8NPC1
SCHEMBL2847505 0.84 ALOX5 (0.51) ALOX5RAB9AALDH1A1KDM4EMAPT
SCHEMBL521956 0.83 TLR8 (0.44) NQO1TLR8ALDH1A1KDM4EMAPT
SCHEMBL21192544 0.83 CYP1A2 (0.41) ALOX5S1PR1RAB9AALDH1A1KDM4E
SCHEMBL28253133 0.83 NCF1 (0.47) ALOX5NQO1NPC1RAB9AKDM4E
SCHEMBL935476 0.83 TLR8 (0.45) ALOX5NQO1S1PR1TLR8NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025095080-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PATTERN PRODUCT, AND CURED PRODUCT 株式会社レゾナック 2025-05-08 WO claimed
CN-113168102-B Photosensitive resin composition, method for producing pattern cured product, interlayer insulating film, coverlay, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2024-11-19 CN claimed
CN-113168102-A Photosensitive resin composition, method for producing patterned cured product, interlayer insulating film, covercoat, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2021-07-23 CN claimed
WO-2020071204-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED PRODUCT, CURED PRODUCT, INTERLAYER INSULATING FILM, COVER COAT LAYER, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT 日立化成デュポンマイクロシステムズ株式会社 2020-04-09 WO claimed
US-10442941-B2 Curable compositions BLUE CUBE IP LLC (US) 2019-10-15 US claimed
US-20180072900-A1 CURABLE COMPOSITIONS DOW GLOBAL TECHNOLOGIES LLC 2018-03-15 US claimed
EP-3271429-A1 CURABLE COMPOSITIONS Blue Cube IP LLC (US) 2018-01-24 EP claimed
WO-2016160346-A1 CURABLE COMPOSITIONS BLUE CUBE IP LLC (US) 2016-10-06 WO claimed
EP-2167481-A1 METHOD FOR PRODUCING PROPYLENE OXIDE Sumitomo Chemical Company, Limited (JP) 2010-03-31 EP claimed
WO-2008156205-A1 METHOD FOR PRODUCING PROPYLENE OXIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-12-24 WO claimed
EP-0424124-B1 Positive-acting photoresist compositions MINNESOTA MINING & MFG (US) 1996-09-11 EP claimed
EP-0424124-A2 Positive-acting photoresist compositions MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-04-24 EP claimed
JP-4195043-A None JP disclosed
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD CANON KK (JP) 2026-04-30 US disclosed
US-12606491-B2 Preceramic 3D-printing monomer and polymer formulations HRL LABORATORIES, LLC (US) 2026-04-21 US disclosed
WO-2025126273-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD 株式会社レゾナック 2025-06-19 WO disclosed
WO-1991016669-A1 PHOTOELECTROGRAPHIC ELEMENTS EASTMAN KODAK COMPANY (US) 1991-10-31 WO disclosed
EP-0250893-A1 Colour filter elements EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1988-01-07 EP disclosed
EP-0244704-A2 Photoelectrographic elements and imaging method EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-11-11 EP disclosed
US-4661429-A CONDUCTIVE LAYER IN ELECTRICAL CONTACT WITH ACID PHOTOGENERATING LAYER EASTMAN KODAK COMPANY (US) 1987-04-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12606491-B2 Preceramic 3D-printing monomer and polymer formulations HTR3D, VCL, ITGB3 ALOX5 914/4885NQO1 2280/4885S1PR1 3825/4885
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD ASIC1, PTGER1, PELP1 ALOX5 186/4885NQO1 3923/4885S1PR1 2846/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.