SCHEMBL7541342

SCHEMBL7541342

CC(c1ccccc1)(S(=O)(=O)c1ccc(C(F)(F)F)cc1)S(=O)(=O)c1ccc(C(F)(F)F)cc1

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.50
TSHR P16473 1/20 0.50
HSD11B1 P28845 5/20 0.46
NR3C2 P08235 1/20 0.45
KIF11 P52732 2/20 0.44
PTGES2 Q9H7Z7 1/20 0.44
CNR2 P34972 3/20 0.43
CNR1 P21554 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
PTGS2 P35354 1/20 0.41
KEAP1 Q14145 1/20 0.40
NFE2L2 Q16236 1/20 0.40
EEF2K O00418 1/20 0.40
OPRM1 P35372 1/20 0.40
OPRL1 P41146 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7543078 0.85 CYP2C19 (0.44) ALDH1A1TSHRHSD11B1NR3C2CA1
SCHEMBL10147798 0.79 ALDH1A1 (0.69) ALDH1A1HSD11B1KIF11PTGES2CNR2
SCHEMBL30166349 0.77 HSD11B1 (0.45) ALDH1A1TSHRHSD11B1KIF11PTGES2
SCHEMBL10146059 0.76 KIF11 (0.48) ALDH1A1HSD11B1KIF11PTGES2CNR2
SCHEMBL353271 0.75 CNR2 (0.57) ALDH1A1HSD11B1KIF11CNR2CNR1
SCHEMBL8430034 0.75 KMT2A (0.49) ALDH1A1TSHRHSD11B1CA1CA2
SCHEMBL29039874 0.75 HSD11B1 (0.62) ALDH1A1TSHRHSD11B1KIF11PTGES2
Trifluoromethylbenzene SCHEMBL4616496 0.74 ALDH1A1 (0.74) ALDH1A1TSHRHSD11B1KIF11CA1
Trifluoromethylbenzene SCHEMBL18787459 0.73 TSHR (0.82) ALDH1A1TSHRKIF11CA1CA2
SCHEMBL14241912 0.73 KIF11 (0.46) ALDH1A1HSD11B1KIF11PTGES2CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed