Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 9/20 | 0.47 |
| ▸ | MAPT | P10636 | 9/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.47 |
| ▸ | RECQL | P46063 | 6/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.47 |
| ▸ | LMNA | P02545 | 4/20 | 0.47 |
| ▸ | MTOR | P42345 | 4/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.47 |
| ▸ | TSHR | P16473 | 4/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.47 |
| ▸ | BLM | P54132 | 3/20 | 0.47 |
| ▸ | APEX1 | P27695 | 3/20 | 0.47 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | THPO | P40225 | 1/20 | 0.47 |
| ▸ | UGT2B7 | P16662 | 1/20 | 0.45 |
| ▸ | ADRB2 | P07550 | 5/20 | 0.42 |
| ▸ | ADRB1 | P08588 | 5/20 | 0.42 |
| ▸ | ADRB3 | P13945 | 4/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL788149 | 0.84 | ALDH1A1 (0.57) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL11112214 | 0.84 | ESR1 (0.46) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL24589240 | 0.83 | TDP1 (0.36) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL241136 | 0.81 | TDP1 (0.65) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL29525823 | 0.81 | TDP1 (0.65) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL31275900 | 0.79 | HIF1A (0.35) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL24589241 | 0.79 | FOLH1 (0.40) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL13711036 | 0.78 | UGT2B7 (0.45) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL24588593 | 0.78 | FOLH1 (0.42) | TDP1MAPTKDM4ERECQLKMT2A | |
| SCHEMBL24313902 | 0.78 | GAA (0.62) | TDP1MAPTKDM4EKMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| CN-116615405-A | Compound, polymer, composition for film formation, method for forming pattern, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-20230028443-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-26 | — | — | US | disclosed |
| US-20230004084-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-05 | — | — | US | disclosed |
| US-20220413383-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-12-29 | — | — | US | disclosed |
| WO-2022138670-A1 | COMPOUND, POLYMER, COMPOSITION, FILM-FORMING COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR FORMING INSULATING FILMS, AND COMPOUND PRODUCTION METHOD | 三菱瓦斯化学株式会社 | 2022-06-30 | — | — | WO | disclosed |
| WO-2022138670-A1 | COMPOUND, POLYMER, COMPOSITION, FILM-FORMING COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR FORMING INSULATING FILMS, AND COMPOUND PRODUCTION METHOD | 三菱瓦斯化学株式会社 | 2022-06-30 | — | — | WO | disclosed |
| US-20210389669-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-16 | — | — | US | disclosed |
| EP-1084105-A4 | CARBAPENEM ANTIBACTERIAL COMPOUNDS, COMPOSITIONS CONTAINING SUCH COMPOUNDS AND METHODS OF TREATMENT | MERCK & CO INC (US) | 2002-10-30 | — | — | EP | disclosed |
| US-6310055-B2 | CARBAPENEM NUCLEUS 2-SUBSTITUTED WITH A HALOPHENOXY LINKED THROUGH AN UNSATURATED GROUP, AND FURTHER INCLUDES AT LEAST ONE AMINE SALT OR QUATERNARY AMMONIUM GROUP; WORKS AGAINST GRAMPOSITIVE METHICILLIN RESISTANT BACTERIA | MERCK & CO., INC. | 2001-10-30 | — | — | US | disclosed |
| US-20010020018-A1 | CARBAPENEM ANTIBACTERIAL COMPOUNDS, COMPOSITIONS CONTAINING SUCH COMPOUNDS AND METHODS OF TREATMENT | MERCK & CO., INC. | 2001-09-06 | — | — | US | disclosed |
| EP-1084105-A1 | CARBAPENEM ANTIBACTERIAL COMPOUNDS, COMPOSITIONS CONTAINING SUCH COMPOUNDS AND METHODS OF TREATMENT | Merck & Co., Inc. (US) | 2001-03-21 | — | — | EP | disclosed |
| WO-1999062878-A1 | CARBAPENEM ANTIBACTERIAL COMPOUNDS, COMPOSITIONS CONTAINING SUCH COMPOUNDS AND METHODS OF TREATMENT | MERCK & CO., INC. (US) | 1999-12-09 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20010020018-A1 | CARBAPENEM ANTIBACTERIAL COMPOUNDS, COMPOSITIONS CONTAINING SUCH COMPOUNDS AND METHODS OF TREATMENT | TOP1, NRDC, PAICS | TDP1 4498/4885MAPT 4547/4885KDM4E 1440/4885 |
| US-20230004084-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, H1-4 | TDP1 4696/4885MAPT 4619/4885KDM4E 2769/4885 |
| US-20210389669-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, AFF4 | TDP1 4013/4885MAPT 3833/4885KDM4E 1502/4885 |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | PHOSPHO1, RER1, RIF1 | TDP1 2166/4885MAPT 2784/4885KDM4E 238/4885 |
| US-20230028443-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HDHD5, H1-0, SCO2 | TDP1 4690/4885MAPT 4764/4885KDM4E 4065/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | TDP1 4013/4885MAPT 3833/4885KDM4E 1502/4885 |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, H1-2 | TDP1 4774/4885MAPT 4799/4885KDM4E 4076/4885 |
| US-20220413383-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, OR10J3 | TDP1 4734/4885MAPT 4811/4885KDM4E 3843/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.