SCHEMBL7541737

SCHEMBL7541737

O=S(=O)(c1ccccc1)C1(S(=O)(=O)c2ccccc2)C=CC=C1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.48
MCOLN3 Q8TDD5 1/20 0.48
HTR6 P50406 2/20 0.46
CA1 P00915 3/20 0.42
CA2 P00918 3/20 0.42
ALDH1A1 P00352 2/20 0.42
CA12 O43570 2/20 0.42
CA9 Q16790 2/20 0.42
HSD17B10 Q99714 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CA3 P07451 1/20 0.42
CA4 P22748 1/20 0.42
CA6 P23280 1/20 0.42
CA5A P35218 1/20 0.42
CA7 P43166 1/20 0.42
PLA2G7 Q13093 1/20 0.42
CA13 Q8N1Q1 1/20 0.42
CA14 Q9ULX7 1/20 0.42
CA5B Q9Y2D0 1/20 0.42
TSHR P16473 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7541828 0.71 GAA (0.44) GAAMCOLN3HTR6CA1CA2
SCHEMBL10656231 0.69 HTR6 (0.55) GAAMCOLN3HTR6CA1CA2
SCHEMBL16865174 0.68 GAA (0.83) GAAMCOLN3HTR6CA1CA2
SCHEMBL28433748 0.68 GAA (0.56) GAAMCOLN3HTR6CA1CA2
SCHEMBL7124034 0.67 HTR6 (0.52) GAAMCOLN3HTR6CA1CA2
SCHEMBL9329312 0.66 HTR6 (0.58) GAAMCOLN3HTR6CA1CA2
SCHEMBL13835654 0.66 HTR6 (0.58) GAAMCOLN3HTR6CA1CA2
SCHEMBL29653727 0.66 HTR6 (0.58) GAAMCOLN3HTR6CA1CA2
SCHEMBL2786645 0.66 GAA (0.52) GAAMCOLN3HTR6CA1CA2
SCHEMBL777178 0.65 GAA (0.47) GAAMCOLN3HTR6CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed